Chemical Vapor Deposition of Zirconium Compounds: A Review
Source abstract
Abstract
Coatings of zirconium compounds are used in a wide variety of fields, yet an understanding and descriptions of deposition mechanisms are scant in the public literature. The mechanisms of deposition for metallic zirconium, ZrC, ZrN, ZrO2, ZrB2, and zirconium silicides are discussed based on the direct vapor deposition research of those compounds where possible or compared to complementary titanium systems when direct research is lacking. Both inorganic and organometallic deposition systems are discussed. As a class of compounds, an understanding of the vapor deposition mechanisms can be significantly improved by investigations on metallic zirconium deposition by zirconium halides and hydrogen and by in situ analysis techniques such as Fourier-transform infrared (FTIR) spectroscopy or x-ray photoelectron spectroscopy (XPS).
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Research context
OpenAlex topics: Semiconductor materials and devices · Nuclear Materials and Properties · Semiconductor materials and interfaces
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Affiliations
Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN 37830, USA
Funding
Laboratory Directed Research and Development Program of Oak Ridge National Laboratory
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