Contamination Particles and Plasma Etching Behavior of Atmospheric Plasma Sprayed Y2O3 and YF3 Coatings under NF3 Plasma
Source abstract
Abstract
Yttrium oxide (Y2O3) and yttrium oxyfluoride (YO0.6F2.1) protective coatings were prepared by an atmospheric plasma spraying technique. The coatings were exposed to a NF3 plasma. After the NF3 plasma treatment, the mass loss of the coatings showed that the etching rate of YO0.6F2.1 was larger than that of the Y2O3. X-ray photoelectron spectroscopy revealed that YO0.5F1.9 was present in the Y2O3 coating, whereas YO0.4F2.2 was present in the YO0.6F2.1 coating. Transmission electron microscope analysis conducted on contamination particles generated during the plasma etching showed that both coatings were mainly composed of YFx. The contamination particles estimated by in-situ particle monitoring sensor revealed that the YO0.6F2.1 compared with the Y2O3 coatings produced 65% fewer contamination particles.
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Research context
OpenAlex topics: Plasma Diagnostics and Applications · Metal and Thin Film Mechanics · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Materials and Energy Measurement Center, Korea Research Institute of Standards and Science (KRISS), Daejeon 34113, Korea
Department of Chemical Engineering, Hanyang University, Seoul 04763, Korea
Funding
Development Program of Measurement Technology for Advanced Ultra-thin Film Processing in Korea Research Institute of Standards and Science and by the Converging Research Center Program through the Ministry of Science, ICT and Future Planning, Korea · by Development of Reliability Technology of Standard Measurement for Hydrogen Convergence Station funded by Korea Research Institute of Standards and Science
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