Surface Stoichiometry and Optical Properties of Cux–TiyCz Thin Films Deposited by Magnetron Sputtering
Source abstract
Abstract
Ternary carbide in metal matrix composites constitute a big challenge in the industry, and in this regard their surface treatment is one of the most important issues. Ternary carbide (CuxTiyCz, where x, y and z are integers) thin films are synthesized by magnetron sputtering and characterized with respect to the film depth. X-ray photoelectron spectroscopy (XPS) of Cu-2p and Ti-2p peaks shows the associated shake-up satellite peaks at a smaller film depth; the peak intensity is reduced at a higher depth. The relative intensity of Cu and Ti increases at a larger film depth. The optical band gap varies from 1.83 to 2.20 eV at different film depths.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · ZnO doping and properties · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Physics, Indian Institute of Engineering Science and Technology, Shibpur, Howrah 711103, West Bengal, India
Department of Electronics, Vidyasagar College, 39 Sankar Ghosh Lane, Kolkata 06 W.B., India
Department of Physics, Dinabandhu Andrews College, Raja S.C. Mallick Road, Kolkata 08 W.B., India
UGC-DAE Consortium for Scientific Research, Indore 452017, MP, India
Surface Physics and Material Science Division, Saha Institute of Nuclear Physics, Kolkata 700064, India
Institute of Physics, University of Greifswald, Felix-Hausdorff-Str.6, 17489 Greifswald, Germany
References (30)
Show source-provided references
1. Callister, W.D. (2007). Materials Science and Engineering: An Introduction, John Wiley & Sons.
2. Study of the preparation of Cu-TiC composites by reaction of soluble Ti and ball-milled carbon coating TiC10.1016/j.rinp.2018.02.059 ↗
3. Cast in situ Cu–TiC composites: Synthesis by SHS route and characterization10.1016/j.msea.2008.10.002 ↗
4. The effect of reinforcement percentages on properties of copper matrix composites reinforced with TiC particles10.1016/j.jallcom.2016.03.085 ↗
5. Abrasive wear behavior of TiB2 particle-reinforced copper matrix composites10.1016/S0921-5093(99)00752-2 ↗
6. Microstructure, mechanical properties, electrical conductivity and wear behavior of high volume TiC reinforced Cu-matrix composites10.1016/j.matchar.2008.09.014 ↗
7. Analyzing dry sliding wear behaviour of copper matrix composites reinforced with pre-coated SiCp particles10.1016/j.matdes.2008.04.055 ↗
8. Effect of the TiC content on microstructure and thermal properties of Cu–TiC composites prepared by powder metallurgy10.1007/s10973-014-3900-6 ↗
9. Sliding wear behavior of TiC-reinforced Cu-4 wt.% Ni matrix composites10.1007/s11665-016-2303-1 ↗
10. Effect of friction stir processing on the microstructure and mechanical properties of Cu–TiC composite10.1016/j.ceramint.2014.04.158 ↗
11. The influence of technological process on dry sliding wear behaviour of titanium carbide reinforcement copper matrix composites10.2320/matertrans.M2010270 ↗
12. Effects of process parameters on microstructure and properties of TiC reinforced Cu-matrix composites
13. Investigation of electrical and mechanical properties of Cu matrix TiC reinforced composites
14. Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films10.1063/1.3467001 ↗
15. Ionized physical vapor deposition (IPVD): A review of technology and applications10.1016/j.tsf.2006.03.033 ↗
16. The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge10.1016/j.tsf.2006.04.051 ↗
17. Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films10.1016/j.surfcoat.2011.11.032 ↗
18. A strategy for increased carbon ionization in magnetron sputtering discharges10.1016/j.diamond.2011.12.043 ↗
19. Deposition of thin titanium–copper films with antimicrobial effect by advanced magnetron sputtering methods10.1016/j.msec.2011.06.009 ↗
20. Moulder, J.F., Stickle, W.F., Sobol, P.E., and Bomben, K.D. (1992). Handbook of X-Ray Photoelectron Spectroscopy, Perkin-Elmer Corporation.
21. Fiermans, L., Vennik, J., and Dekeyser, W. (1978). Electron and Ion Spectroscopy of Solids, Plenum.10.1007/978-1-4684-2817-9 ↗
22. C–N–S tridoped TiO2 for photocatalytic degradation of tetracycline under visible-light irradiation10.1016/j.apcata.2011.04.008 ↗
23. Role of nitrogen in the formation of HC-N films by CH4/N2 barrier discharge plasma: Aliphatic tendency10.1021/jp906654m ↗
24. Majumdar, A., Drache, S., Wulff, H., Mukhopadhyay, A.K., Bhattacharyya, S., Helm, C.A., and Hippler, R. (2017). Strain effects by surface oxidation of Cu3N thin films deposited by DC magnetron sputtering. Coatings, 7.10.3390/coatings7050064 ↗
25. Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Sc, Ti, V, Cu and Zn10.1016/j.apsusc.2010.07.086 ↗
26. (2019, April 26). NIST X-ray Photoelectron Spectroscopy Database, Available online: https://srdata.nist.gov/xps/.
27. XPS characterization of surface and interfacial structure of sputtered TiNi films on Si substrate10.1016/j.msea.2005.04.036 ↗
28. Production of copper-matrix composites by in situ processing10.1007/BF00369685 ↗
29. Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering10.1088/0022-3727/43/28/285203 ↗
30. Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure10.1088/0022-3727/42/10/105204 ↗