journal article·1992-03-01

PWB Interconnect Strategy Using a Full Build Electroless Copper Plating System:

J. Cisson, J. Seigo, K. Minten

Circuit World· Volume 18· Issue 4
Publisher page

Abstract

This paper constitutes a follow-up to earlier work published in Circuit World, Vol. 17, No. 4. The first paper studied the metallographic structures of two commercially available full build electroless copper foils. Part 2 reports the investigations carried out into the etching characteristics of these copper foils, chemically deposited from full build electroless copper baths designated high elongation (HE) and high strength (HS). It is shown that, although attention should be given to the choice of etchant for these copper foils, they do not exhibit an uncontrollable etch rate, as is often feared.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Electrodeposition and Electroless Coatings · Copper Interconnects and Reliability · Corrosion Behavior and Inhibition

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Digital Equipment Corporation, Greenville, South Carolina, USA

References (9)

Show source-provided references
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8. Nakahara H. · 1991 · 50
9. Margraf D. J. · 1987