Dry film photoresists ‐ a never ending success story?
Source abstract
Abstract
Reviews the use and development of dry film photoresists and liquid resists. Provides an historical perspective and considers factors affecting investment in the future. Discusses both the advantages and limitations of dry film and liquid photoresists. Provides an outlook for future developments.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advancements in Photolithography Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References
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