Front Cover: Formation of Layer‐by‐Layer Assembled Cocatalyst Films of S²⁻‐Stabilized Ni₃S₄ Nanoparticles for Hydrogen Evolution Reaction (ChemNanoMat 10/2017)

Sungwon Kim; Toshio Nishino; Masaki Saruyama; Masanori Sakamoto; Hiroyuki Kobayashi; Seiji Akiyama; Taro Yamada; Kazunari Domen; Toshiharu Teranishi

doi:10.1002/cnma.201700273

journal article·2017-10Open access

Front Cover: Formation of Layer‐by‐Layer Assembled Cocatalyst Films of S²⁻‐Stabilized Ni₃S₄ Nanoparticles for Hydrogen Evolution Reaction (ChemNanoMat 10/2017)

Sungwon Kim, Toshio Nishino, Masaki Saruyama, Masanori Sakamoto, Hiroyuki Kobayashi, Seiji Akiyama, Taro Yamada, Kazunari Domen, Toshiharu Teranishi

ChemNanoMat· Volume 3· Issue 10

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Source abstract

Abstract

Ni3S4 nanoparticles are a potential candidate as an electrocatalyst and a photocatalyst for hydrogen evolution reaction. Films of S2–-stabilized Ni3S4 nanoparticles can be assembled on fluorine-doped tin oxide electrodes and photoelectrodes by a layer-by-layer (LbL) process with metal cation linkers under mild conditions. For both electrodes, the LbL assembled films showed higher photocurrents and current densities with increasing light irradiation time. This LbL assembly process could be applicable to forming ligand-free and robust nanoparticle films for many types of photoelectrodes without deteriorating their intrinsic optical properties. More information can be found in the Full Paper by T. Teranishi et al. on page 764 in Issue 10, 2017 (DOI: 10.1002/cnma.201700220).

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Research context

Nanomaterials Catalysis & surfaces

OpenAlex topics: Chalcogenide Semiconductor Thin Films

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemistry Graduate School of Science Kyoto University, Gokasho Uji Kyoto 611-0011 Japan

Institute for Chemical Research Kyoto University, Gokasho Uji Kyoto 611-0011 Japan

FUJIFILM Corporation, 577, Ushijima Kaisei-Machi, Ashigarakami-gun Kanagawa 258-8577 Japan

Japan Technological Research Association of Artificial Photosynthetic Chemical Process (ARPChem) 7-3-1 Hongo, Bunkyo-ku Tokyo 113-8656 Japan

Mitsubishi Chemical Corporation Yokohama R&D Center 1000, Kamoshida-cho, Aoba-ku Yokohama-shi Kanagawa 227-8502 Japan

Department of Chemical System Engineering The University of Tokyo 7-3-1, Hongo, Bunkyo-ku Tokyo 113-8656 Japan

References

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