journal article·2024-05Open access

Hexagonal Boron Nitride Spacers for Fluorescence Imaging of Biomolecules

Xiliang Yang, Dong Hoon Shin, Ze Yu, Kenji Watanabe, Takashi Taniguchi, Vitaliy Babenko, Stephan Hofmann, Sabina Caneva

ChemNanoMat· Volume 10· Issue 5

Abstract

Abstract Fluorescence imaging is an invaluable tool to investigate biomolecular dynamics, mechanics, and interactions in aqueous environments. Two‐dimensional materials offer large‐area, atomically smooth surfaces for wide‐field biomolecule imaging. Despite the success of graphene for on‐chip biosensing and biomolecule manipulation, its strong fluorescence‐quenching properties pose a challenge for biomolecular investigations that are based on direct optical readouts. Here, we employ few‐layer hexagonal boron nitride (hBN) as a precisely tailorable fluorescence spacer between labelled lipid membranes and graphene substrates. By stacking high‐quality hBN crystals in the 10–20 nm thickness range on monolayer graphene, we observe distance‐dependent fluorescence intensity variations. Remarkably, with hBN spacers as thin as 20 nm, the fluorescence intensity is comparable to bare SiO2/Si substrates, while the intensity was reduced to 60 % and 80 % with ~10 nm and ~16 nm hBN thicknesses respectively. We confirm that pre‐determined hBN thicknesses can be employed to control the non‐radiative energy transfer properties of graphene, with fluorescence quenching following a d−4 distance‐dependent behaviour. This seamless integration of electronically active and dielectric van der Waals materials into vertical heterostructures enables multifunctional platforms addressing the manipulation, localization, and visualization of biomolecules for fundamental biophysics and biosensing applications.
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Research context

OpenAlex topics: Boron and Carbon Nanomaterials Research · MXene and MAX Phase Materials · Graphene and Nanomaterials Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Precision and Microsystems Engineering Delft University of Technology Mekelweg 2 2628 CD Delft The Netherlands

Present address: Department of Electronics and Information Engineering Korea University Sejong 30019 Republic of Korea

National Institute for Materials Science 1-1 Namiki Tsukuba Ibaraki 305-0044 Japan

Department of Engineering University of Cambridge Cambridge CB3 0FA UK

Funding

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

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