A Novel Two‐Step Ammonia‐Free Atomic Layer Deposition Approach for Boron Nitride

Abstract Due to their high potential in energy and environment domains, synthetic approach allowing fabrication of high quality boron nitride (BN) structures in a controlled manner is of great interest. Herein, a two‐step ammonia‐free atomic layer deposition approach to BN, based on polymer‐derived‐ceramics chemistry, is reported for the first time. Using trichloroborazine and hexamethyldisilazane as precursors, a conformal pre‐ceramic polymer layer is grown at low temperature, 80 °C, and then converted into dense hexagonal BN (h‐BN). The present approach allows conformal and homogeneous deposition of h‐BN films on various substrates with a thickness control at the atomic scale. It proves to be successful for fabricating various tuned BN nanostructures and composites that are efficient in water purification. In particular, the obtained nanostructures demonstrate high hydrophobicity and they are investigated as water filters for organic/water separation. Good separation efficiency is demonstrated that highlights the high potential of such atomic layer deposition (ALD) structures in water treatment.