journal article·2025-01-09

Metal-Core-Specific Screening with Machine Learning: Accelerating the Discovery of Metal Oxide Clusters for Enhanced EUV Lithography Resolution

Fang-Ling Yang, Zong-Biao Ye, Yu-Qi Chen, Pan-Pan Zhou, Fu-Jun Gou

Publisher page

Abstract

Obtaining effective extreme ultraviolet lithography (EUVL) materials for pragmatic applications remains challenging. The experimental design and conventional theoretical prediction are time-consuming and costly and hardly affordable to accelerate the discovery of commercial EUVL materials. In this work, we employed the machine learning (ML) technique to predict the ionization potential of promising EUVL materials, which is closely related to the photoresists' solubility switch. The developed ML model presents a strong generalization ability and can predict new EUVL materials containing different metals (i.e., Mg, Cu, Ca, Cd, Ni). Furthermore, feature analysis indicates that the number of hydrogen bond donors in a compound plays a vital role in determining the ionization potential of EUVL materials. The work provides not only an effective ML model to predict EUVL materials but also crucial insights into the correlation between the structure and properties. Finally, the developed ML model has been integrated into an online platform (https://zinc-oxo-cluster-predictor.streamlit.app/), allowing users to quickly evaluate their designed materials and develop a comprehensive scheme for discovering promising EUVL compounds based on our platform.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advancements in Photolithography Techniques · Electron and X-Ray Spectroscopy Techniques · X-ray Diffraction in Crystallography

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, No. 24 South Section 1, Yihuan Road, 610065 Chengdu, People’s Republic of China

State Key Laboratory of Applied Organic Chemistry, Key Laboratory of Nonferrous Metal Chemistry and Resources Utilization of Gansu Province, College of Chemistry and Chemical Engineering, Lanzhou University, No. 222 South Tianshui Road, 730000 Lanzhou, People’s Republic of China

Funding

Sichuan University

References (31)

Show source-provided references
1. 10.1007/s40843-023-2827-810.1007/s40843-023-2827-8 ↗
2. 10.1039/D3TA00115F10.1039/D3TA00115F ↗
3. 10.1039/D0TC03597A10.1039/D0TC03597A ↗
4. 10.1117/1.JMM.18.4.04350410.1117/1.JMM.18.4.043504 ↗
5. 10.1016/j.ccr.2023.21530710.1016/j.ccr.2023.215307 ↗
6. 10.1002/adfm.20210153310.1002/adfm.202101533 ↗
7. 10.1039/C7CS00080D10.1039/C7CS00080D ↗
8. 10.1002/adma.20150117110.1002/adma.201501171 ↗
9. Xu, H.; Yang, K.; Sakai, K.; Kosma, V.; Kasahara, K.; Giannelis, E. P.; Ober, C. K. EUV metal oxide hybrid photoresists: ultra-small structures for high-resolution patterning. Extreme Ultraviolet (EUV) Lithography IX; SPIE: 2018; pp 391–396.
10. 10.1021/acsmaterialsau.1c0005910.1021/acsmaterialsau.1c00059 ↗
11. Hinsberg, W. D.; Meyers, S. A numeric model for the imaging mechanism of metal oxide EUV resists. Advances in Patterning Materials and Processes XXXIV; SPIE: 2017; pp 14–24.10.1117/12.2260265 ↗
12. Wu, L.; Vockenhuber, M.; Ekinci, Y.; Castellanos, S. The role of the organic shell in hybrid molecular materials for EUV lithography. Extreme Ultraviolet (EUV) Lithography X; SPIE: 2019; pp 19–25.10.1117/12.2515264 ↗
13. 10.1117/1.JMM.19.3.03460110.1117/1.JMM.19.3.034601 ↗
14. 10.1063/5.004726910.1063/5.0047269 ↗
15. 10.1039/D1CP02334A10.1039/D1CP02334A ↗
16. 10.1039/D3NJ01464A10.1039/D3NJ01464A ↗
17. Mack, C. A.; Thackeray, J. W.; Biafore, J. J.; Smith, M. D. Stochastic exposure kinetics of EUV photoresists: a simulation study. Extreme Ultraviolet (EUV) Lithography II; SPIE: 2011; pp 428–449.10.1117/12.881066 ↗
18. 10.1007/s44275-024-00002-310.1007/s44275-024-00002-3 ↗
19. 10.1063/1.508472810.1063/1.5084728 ↗
20. 10.1016/S0031-8914(34)90011-210.1016/S0031-8914(34)90011-2 ↗
21. Reback, J.; McKinney, W.; Van Den Bossche, J.; Augspurger, T.; Cloud, P.; Klein, A.; Hawkins, S.; Roeschke, M.; Tratner, J.; She, C. pandas-dev/pandas: Pandas 1.0.5. Zenodo 2020.
22. 10.1109/TIT.1967.105396410.1109/TIT.1967.1053964 ↗
23. Drucker H. · Advances in neural information processing systems · 1996 · 9 · 155
24. 10.1023/A:101805431435010.1023/A:1018054314350 ↗
25. Prokhorenkova L. · Advances in neural information processing systems · 2018 · 31 · 6638
26. Ke G. · Advances in neural information processing systems · 2017 · 30 · 3146
27. 10.1023/A:101093340432410.1023/A:1010933404324 ↗
28. 10.1037/h004251910.1037/h0042519 ↗
29. Chen, T.; Guestrin, C. Xgboost: A scalable tree boosting system. Proceedings of the 22nd acm sigkdd international conference on knowledge discovery and data mining, 2016; pp 785–794.10.1145/2939672.2939785 ↗
30. 10.1214/aos/101320345110.1214/aos/1013203451 ↗
31. Pedregosa F. · Journal of Machine Learning Research · 2011 · 12 · 2825