journal article·2021-03-23Open access

Challenges in Controlled Thermal Deposition of Organic Diradicals

Tobias Junghoefer, Nolan M. Gallagher, Kubandiran Kolanji, Erika Giangrisostomi, Ruslan Ovsyannikov, Thomas Chassé, Martin Baumgarten, Andrzej Rajca, Arrigo Calzolari, Maria Benedetta Casu

Chemistry of Materials· Volume 33· Issue 6

Abstract

We demonstrate that it is possible to evaporate diradicals in a controlled environment obtaining thin films in which the diradical character is preserved. However, evaporation represents a challenge. The presence of two radical sites makes the molecules more reactive also in the case of very stable single radicals. We have explored the parameters that play a role in this phenomenon. We found that the higher the formation energies of the crystal, the more difficult is the evaporation of intact radicals. Large delocalization of the unpaired electrons helps the diradical to stand evaporation. We have also investigated the lifetime of the films when exposed to X-rays or air. The onset of thermal degradation plays a role in the film lifetime. In fact, the lower the evaporation temperature with respect to the onset temperature, the longer is the film lifetime. The evaporation of different diradicals can be successfully addressed considering our findings.
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Research context

OpenAlex topics: Advanced Chemical Physics Studies · Molecular Junctions and Nanostructures · Photochemistry and Electron Transfer Studies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute of Physical and Theoretical Chemistry, University of Tübingen, Tübingen 72076, Germany

Department of Chemistry, University of Nebraska, Lincoln 68588-0304, United States

Max Planck Institute for Polymer Research, Mainz 55128, Germany

Helmholtz-Zentrum Berlin, Berlin 12489, Germany

CNR-NANO Istituto Nanoscienze, Centro S3, Modena 41125, Italy

Funding

Division of Chemistry · Deutsche Forschungsgemeinschaft · Helmholtz-Zentrum Berlin

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