Reversible Nanopatterning on Self-Assembled Monolayers on Gold
Source abstract
Abstract
The reversible fabrication of positive and negative nanopatterns on 1-hexadecanethiol (HDT) self-assembled monolayers (SAMs) on Au(111) was realized by bias-assisted atomic force microscopy (AFM) nanolithography using an ethanol-ink tip. The formation of positive and negative nanopatterns via the bias-assisted nanolithography depends solely on the polarity of the applied bias, and their writing speeds can reach 800 μm/s and go beyond 1000 μm/s, respectively. The composition of the positive nanopatterns is gold oxide and the nanometer-scale gold oxide can be reduced by ethanol to gold, as proved by X-ray photoelectron spectroscopy (XPS) analysis, forming the negative nanopatterns which can be refilled with HDT to recover the SAMs. The inked material of ethanol acts as a reductant which is transferred to the substrate for the local chemical reactions like that in dip-pen nanolithography (DPN). The negative nanopatterns can be used as templates, for example, for the immobilization of magnetic nanoparticles. Interestingly, we found that the nanometer-scale gold oxide was very stable on hydrophobic HDT/Au(111) in air, whereas on hydrophilic SAMs it decomposed soon and resulted in the formation of the negative nanopattern. In addition, the effect of bias on the nanolithography was investigated.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Molecular Junctions and Nanostructures · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of Electroanalytical Chemistry, Changchun Institute of Applied Chemistry and Graduate School of Chinese Academy of Sciences, Chinese Academy of Sciences, Changchun 130022, People's Republic of China
References (50)
Show source-provided references
1. Xie X. N. · Mater. Sci. Eng., R · 2006 · 54 · 110.1016/j.mser.2006.10.001 ↗
2. Garcia R. · Chem. Soc. Rev. · 2006 · 35 · 2910.1039/B501599P ↗
3. Tseng A. A. · J. Vac. Sci. Technol., B · 2005 · 23 · 87710.1116/1.1926293 ↗
4. Kramer S. · Chem. Rev. · 2003 · 103 · 436710.1021/cr020704m ↗
5. Piner P. D. · Science · 1999 · 283 · 66110.1126/science.283.5402.661 ↗
6. Liu G. Y. · Acc. Chem. Res. · 2000 · 33 · 45710.1021/ar980081s ↗
7. Binnig G. · Appl. Phys. Lett. · 1999 · 74 · 132910.1063/1.123540 ↗
8. Cappella B. · J. Appl. Phys. · 2002 · 91 · 50610.1063/1.1421632 ↗
9. Maoz R. · Adv. Mater. · 1999 · 11 · 5510.1002/(SICI)1521-4095(199901)11:1<55::AID-ADMA55>3.0.CO;2-8 ↗
10. Zhao J. W. · Langmuir · 2001 · 17 · 778410.1021/la010635r ↗
11. Xie X. N. · J. Am. Chem. Soc. · 2005 · 127 · 1556210.1021/ja054225r ↗
12. Jang J.-W. · Small · 2007 · 3 · 60010.1002/smll.200600679 ↗
13. Li Y. · J. Am. Chem. Soc. · 2001 · 123 · 210510.1021/ja005654m ↗
14. Cai Y. G. · J. Am. Chem. Soc. · 2005 · 127 · 1628710.1021/ja054951u ↗
15. Sato A. · Nature · 1993 · 363 · 43110.1038/363431a0 ↗
16. Huo L. H. · Chem. Mater. · 2000 · 12 · 79010.1021/cm990690+ ↗
17. Widrig C. A. · J. Electroanal. Chem. · 1991 · 310 · 33510.1016/0022-0728(91)85271-P ↗
18. Schoer J. K. · J. Phys. Chem. · 1996 · 100 · 1108610.1021/jp960271p ↗
19. Bain C. D. · J. Am. Chem. Soc. · 1989 · 111 · 32110.1021/ja00183a049 ↗
20. Xie X. N. · Adv. Funct. Mater. · 2007 · 17 · 91910.1002/adfm.200600439 ↗
21. Nuzzo R. G. · J. Am. Chem. Soc. · 1987 · 109 · 73310.1021/ja00237a017 ↗
22. Pireaux J. J. · Surf. Sci. · 1984 · 141 · 22110.1016/0039-6028(84)90207-3 ↗
23. Koslowski B. · Surf. Sci. · 2001 · 475 · 110.1016/S0039-6028(00)00986-9 ↗
24. Heister K. · J. Phys. Chem. B · 2001 · 105 · 405810.1021/jp010127q ↗
25. Krozer A. · J. Vac. Sci. Technol., A · 1997 · 15 · 170410.1116/1.580924 ↗
26. Ron H. · J. Am. Chem. Soc. · 1998 · 120 · 1344410.1021/ja9823722 ↗
27. Ron H. · Langmuir · 1998 · 14 · 111610.1021/la970785v ↗
28. Zhao J. W. · Nano Lett. · 2002 · 2 · 13710.1021/nl0100769 ↗
29. Gorman C. B. · Langmuir · 2000 · 16 · 631210.1021/la0003241 ↗
30. Zhou D. · Angew. Chem., Int. Ed. · 2003 · 42 · 493410.1002/anie.200352178 ↗
31. Krysinski P. · J. Bioelectrochemistry · 2005 · 66 · 7110.1016/j.bioelechem.2004.03.012 ↗
32. Kim Y. · J. Am. Chem. Soc. · 2005 · 127 · 938010.1021/ja052319v ↗
33. Tello M. · Adv. Mater. · 2005 · 17 · 148010.1002/adma.200401466 ↗
34. Jung H. · J. Am. Chem. Soc. · 2003 · 125 · 1209610.1021/ja0363720 ↗
35. Noy A. · J. Nano Lett. · 2002 · 2 · 10910.1021/nl010081c ↗
36. Lim J.-H. · Adv. Mater. · 2002 · 14 · 147410.1002/1521-4095(20021016)14:20<1474::AID-ADMA1474>3.0.CO;2-2 ↗
37. Maynor B. W. · J. Am. Chem. Soc. · 2002 · 124 · 52210.1021/ja017365j ↗
38. Fu L. · Nano Lett. · 2003 · 3 · 75710.1021/nl034172g ↗
39. Li J. · Chem. Mater. · 2004 · 16 · 163310.1021/cm0344764 ↗
40. Hyun J. · J. Am. Chem. Soc. · 2004 · 126 · 477010.1021/ja049956q ↗
41. Demers L. M. · Science · 2002 · 296 · 183610.1126/science.1071480 ↗
42. Lee K.-B. · J. Am. Chem. Soc. · 2003 · 125 · 558810.1021/ja034236p ↗
43. Zheng Z. K. · Nanotechnology · 2006 · 17 · 537810.1088/0957-4484/17/21/016 ↗
44. Yang M. · Nanotechnology · 2006 · 17 · 33010.1088/0957-4484/17/1/057 ↗
45. Lewis M. S. · J. Phys. Chem. B · 2004 · 108 · 858110.1021/jp0379244 ↗
46. Perez-Murano F. · Appl. Phys. Lett. · 2003 · 82 · 308610.1063/1.1572480 ↗
47. Galleja M. · J. Appl. Phys. · 2002 · 92 · 553910.1063/1.1510171 ↗
48. Gomez-Monivas S. · Phys. Rev. Lett. · 2003 · 91 · 05610110.1103/PhysRevLett.91.056101 ↗
49. Yang M. · J. Phys. Chem. B · 2006 · 110 · 1036510.1021/jp0553030 ↗
50. Sharpe R. B. A. · J. Am. Chem. Soc. · 2006 · 128 · 1556010.1021/ja065291b ↗