journal article·2002-12-01

Precursor Morphology Controlled Formation of Rutile VO2 Nanorods and Their Self-Assembled Structure

Zhou Gui, Rong Fan, Weiqin Mo, Xianhui Chen, Ling Yang, Shuyuan Zhang, Yuan Hu, Zhangzhou Wang, Weicheng Fan

Chemistry of Materials· Volume 14· Issue 12
Publisher page

Abstract

Rutile VO 2 nanorods have been synthesized by the precursor morphology controlled formation. The precursor single-crystal VO 2 hydrate nanorods have been obtained via the hydrothermal reaction of KOH, V 2 O 5, and hydrazine in a sealed autoclave at low temperature. The reducing agent N 2 H 4 plays a key role in the control of one-dimensional morphology. According to the data of differential scanning calorimetry and thermogravimetric analysis, rutile VO 2 nanorods have been formed when the precursor VO 2 hydrate is heated at 340 °C for 1 day in flowing N 2 and maintaining the morphology of the precursor. The products have been characterized by means of X-ray powder diffraction, transmission electron microscopy, high-resolution electron microscopy, selected area electron diffraction, and X-ray energy-dispersive spectroscopy techniques. It is shown that these rutile VO 2 nanorods are self-assembled by VO 2 nanocrystalline domains with the same crystallographic direction along the rod axis. The reaction details and features are described and discussed.
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Research context

OpenAlex topics: Transition Metal Oxide Nanomaterials · Gas Sensing Nanomaterials and Sensors · TiO2 Photocatalysis and Solar Cells

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Lab of Fire Science, Department of Physics, and Structural Research Laboratory, University of Science and Technology of China, Hefei, 230026, P.R. China

References (18)

Show source-provided references
1. Hu J. T. · Acc. Chem. Res. · 1999 · 32 · 43510.1021/ar9700365 ↗
2. Wu Y. · Chem. Mater. · 2000 · 12 · 60510.1021/cm9907514 ↗
3. Yazawa M. · Appl. Phys. Lett. · 1992 · 61 · 205110.1063/1.108329 ↗
4. Choi Y. C. · Adv. Mater. · 2000 · 12 · 74610.1002/(SICI)1521-4095(200005)12:10<746::AID-ADMA746>3.0.CO;2-N ↗
5. Morales A. M. · Science · 1998 · 279 · 20810.1126/science.279.5348.208 ↗
6. Huang M. H. · Chem. Commun. · 2000 · 12 · 106310.1039/b002549f ↗
7. Zhang J. H. · Adv. Mater. · 2000 · 12 · 134810.1002/1521-4095(200009)12:18<1348::AID-ADMA1348>3.0.CO;2-X ↗
8. Huang M. H. · Adv. Mater. · 2001 · 13 · 11310.1002/1521-4095(200101)13:2<113::AID-ADMA113>3.0.CO;2-H ↗
9. Morin F. · J. Phys. Rev. Lett. · 1959 · 3 · 3410.1103/PhysRevLett.3.34 ↗
10. Rogers K. D. · J. Appl. Phys. · 1991 · 70 · 141210.1063/1.349550 ↗
11. Takahashi Y. · J. Mater. Sci. · 1989 · 24 · 19210.1007/BF00660953 ↗
12. Chain E. E. · Appl. Opt. · 1991 · 30 · 278210.1364/AO.30.002782 ↗
13. Fan J. C. · Appl. Phys. Lett. · 1977 · 30 · 1110.1063/1.89480 ↗
14. Balberb I. · J. Appl. Phys. · 1977 · 46 · 211110.1063/1.321849 ↗
15. Razavi A. · J. Vac. Sci. Technol. · 1989 · 7 · 131010.1116/1.576276 ↗
16. Tsang C. · J. Electrochem. Soc. · 1997 · 144 · 52010.1149/1.1837442 ↗
17. Bernard F. · Bull. Soc. Chim. Fr. · 1961 · 1358
18. Gui Z. · J. Solid State Chem. · 2001 · 157 · 25010.1006/jssc.2000.9037 ↗