journal article·2023-08-08

Scalable and Stable Manufacture of Molecular-Sized Silica Nanoparticles by Evaporation-Induced Self-Assembly

Shigeru Sakamoto, Takumi Houya, Takamichi Matsuno, Atsushi Shimojima

Chemistry of Materials· Volume 35· Issue 15
Publisher page

Abstract

Silica nanoparticles on the single-nanometer scale are promising building blocks for the construction of functional nanomaterials. Generally, silica nanoparticles are formed via controlled nucleation and growth in dilute aqueous solutions to avoid aggregation, which hampers their large-scale production and surface modification with organochlorosilanes. Herein, we report a simple and scalable process to prepare uniform and unprecedentedly small silica nanoparticles (∼2 nm in size) via the evaporation-induced self-assembly of silicate species and surfactants in a rotary evaporator. The as-synthesized reverse-type silica–surfactant mesostructured composite was disassembled in tetrahydrofuran to obtain a clear colloidal dispersion. Surface modification was achieved by direct silylation of the mesostructured composite with organochlorosilanes. Small-angle X-ray scattering analysis of the nanoparticle dispersion after surface trimethylsilylation indicated the absence of larger nanoparticles. The trimethylsilylated nanoparticles were assembled by solvent evaporation to form a transparent film. Nanoindentation tests revealed that this nanoparticle film exhibited plasticity and softness similar to organic polymers. Additionally, the thermal stability became significantly higher (10% weight loss at ∼500 °C in the air) when the surface was modified with dimethylsilyl (Me 2 Si(OSi) 2 ) groups. These features of the silica nanoparticles prepared using our method have promising applications in emerging fields.
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Research context

OpenAlex topics: Mesoporous Materials and Catalysis · Photonic Crystals and Applications · Catalytic Processes in Materials Science

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

R&D center, Sony Group Corporation, 4-14-1 Asahi-cho, Atsugi 243-0014, Kanagawa, Japan

Department of Applied Chemistry, School of Advanced Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan

Kagami Memorial Research Institute for Materials Science and Technology, Waseda University, 2-8-26 Nishiwaseda, Shinjuku-ku, Tokyo 169-0051, Japan

Funding

Ministry of Education, Culture, Sports, Science and Technology · Japan Society for the Promotion of Science

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