Self-Patterning Tetrathiafulvalene Crystalline Films
Source abstract
Abstract
Tetrathiafulvalene (TTF) crystals grown from the melt are organized as spherulites in which helicoidal fibrils growing radially from the nucleation center twist in concert with one another. Alternating bright and dark concentric bands are apparent when films are viewed between crossed polarizers, indicating an alternating pattern of crystallographic faces exposed at the film surface. Band-dependent reorganization of the TTF crystals was observed during exposure to methanol vapor. Crystalline growth appears on bright bands at the expense of the dark bands. After a 24 h period of exposure to methanol vapor, the original spherulites were completely restructured, and the films comprise isolated, concentric circles of crystallites whose orientations are determined by the initial TTF crystal fibril orientation. While the surface of these outgrowths appears faceted and smooth, cross-sectional SEM images revealed a semiporous inner structure, suggesting solvent-vapor-induced recrystallization. Collectively, these results show that crystal twisting can be used to rhythmically redistribute material. Crystal twisting is a common and often controllable phenomenon independent of molecular or crystal structure and therefore offers a generalizable path to spontaneous pattern formation in a wide range of materials.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Organic and Molecular Conductors Research · Crystallography and molecular interactions · Solid-state spectroscopy and crystallography
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemistry, Molecular Design Institute, New York University, New York, New York 10003, United States
Department of Chemical Engineering and Materials Science, Stevens Institute of Technology, Hoboken, New Jersey 07030, United States
Funding
Stevens Institute of Technology · Division of Materials Research
References (30)
Show source-provided references
1. 10.1021/cr200297f10.1021/cr200297f ↗
2. 10.3406/bulmi.1907.280110.3406/bulmi.1907.2801 ↗
3. 10.1063/1.171360610.1063/1.1713606 ↗
4. 10.1063/1.171360710.1063/1.1713607 ↗
5. 10.1063/1.170275710.1063/1.1702757 ↗
6. 10.1002/anie.20130122310.1002/anie.201301223 ↗
7. 10.1002/ijch.20210006310.1002/ijch.202100063 ↗
8. 10.1002/cphc.20100096310.1002/cphc.201000963 ↗
9. 10.1021/ja101491n10.1021/ja101491n ↗
10. 10.1039/C5CE00195A10.1039/C5CE00195A ↗
11. 10.1021/acs.chemmater.1c0400310.1021/acs.chemmater.1c04003 ↗
12. 10.1002/adma.20220384210.1002/adma.202203842 ↗
13. 10.1002/adfm.20221253110.1002/adfm.202212531 ↗
14. 10.1021/jacs.6b0627810.1021/jacs.6b06278 ↗
15. 10.1021/ja501338210.1021/ja5013382 ↗
16. 10.1021/ja300257m10.1021/ja300257m ↗
17. 10.1039/D2ME00010E10.1039/D2ME00010E ↗
18. 10.1146/annurev-matsci-081720-11294610.1146/annurev-matsci-081720-112946 ↗
19. 10.1002/pol.1959.120391351010.1002/pol.1959.1203913510 ↗
20. 10.1002/pol.1959.120391350910.1002/pol.1959.1203913509 ↗
21. 10.1021/ar900288m10.1021/ar900288m ↗
22. 10.1039/C4EE00688G10.1039/C4EE00688G ↗
23. 10.1002/adma.20060018810.1002/adma.200600188 ↗
24. 10.1039/b923375j10.1039/b923375j ↗
25. 10.1021/cm00044a04110.1021/cm00044a041 ↗
26. 10.1021/cm00044a04110.1021/cm00044a041 ↗
27. 10.1039/C7CE02107K10.1039/C7CE02107K ↗
28. 10.1002/anie.20035289110.1002/anie.200352891 ↗
29. 10.1021/ja400833r10.1021/ja400833r ↗
30. 10.1002/chir.2355810.1002/chir.23558 ↗