journal article·2023-10-10Open access

Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air

Jihong Yim, Eero Haimi, Miia Mäntymäki, Ville Kärkäs, René Bes, Aitor Arandia Gutierrez, Kristoffer Meinander, Philipp Brüner, Thomas Grehl, Lars Gell, Tiia Viinikainen, Karoliina Honkala, Simo Huotari, Reetta Karinen, Matti Putkonen, Riikka L. Puurunen

Chemistry of Materials· Volume 35· Issue 19

Abstract

Liliana Krotz and Walter Galotta are thanked for carbon content analysis. Hannu Revitzer is thanked for ICP-OES measurements. Joakim Kattelus is thanked for the standard deviation of ICP-OES measurements. Zahra Ahaliabadeh and Ville Miikkulainen are thanked for the design of the fixed bed reactor space for the F-120 reactor. This work made use of the Raw Materials Research Infrastructure and the ALD Center Finland Research Infrastructure. The University of Helsinki acknowledges the Center for X-ray Spectroscopy for providing experiment time and support with the HelXAS spectrometer under Proposal 2021-0011. The DFT calculations were made possible by computational resources provided by the CSC- IT Center for Science. The materials created in the Virtual Project on the History of ALD (VPHA) are acknowledged as a source of information on the early publications on ALD, including catalysis applications. Part of this work has been presented at the ALD 2022 conference, Ghent, Belgium, June 26–29, 2022. Funding Information: The work was financially supported by Prof. Puurunen’s starting grant at Aalto University and by the Academy of Finland (COOLCAT consortium, decision no. 329977 and 329978; ALDI consortium, decision no. 331082; Matter and Materials, decision no. 318913 and decision no. 295696). Publisher Copyright: © 2023 The Authors. Published by American Chemical Society.
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Research context

OpenAlex topics: Catalytic Processes in Materials Science · Semiconductor materials and devices · Electronic and Structural Properties of Oxides

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Affiliations

School of Chemical Engineering, Department of Chemical and Metallurgical Engineering, Aalto University, P.O. Box 16100, FI-00076 Aalto, Espoo, Finland

Department of Chemistry, University of Helsinki, P.O. Box 55, 00014 Helsinki, Finland

Department of Physics, University of Helsinki, P.O. Box 64, 00014 Helsinki, Finland

School of Chemical Engineering, Department of Bioproducts and Biosystems, Aalto University, P.O. Box 16300, FI-00076 Aalto, Espoo, Finland

IONTOF GmbH, Heisenbergstr. 15, 48149 Münster, Germany

Department of Chemistry, Nanoscience Center, University of Jyväskylä, P.O. Box 35, FI-40014 Jyväskylä, Finland

Funding

Academy of Finland

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