Molecular Layer Deposition of “Magnesicone”, a Magnesium-based Hybrid Material
Source abstract
Abstract
Molecular layer deposition (MLD) offers the deposition of ultrathin and conformal organic or hybrid films which have a wide range of applications. However, some critical potential applications require a very specific set of properties. For application as desiccant layers in water barrier films, for example, the films need to exhibit water uptake and swelling and be overcoatable. For application as a backbone for a solid composite electrolyte for lithium ions on the other hand, the films need to be stable against lithium and need to be transformable from a hybrid MLD film to a porous metal oxide film. Magnesium-based MLD films, called “magnesicone”, are promising on both these aspects, and thus, an MLD process is developed using Mg(MeCp)2 as a metal source and ethylene glycol (EG) or glycerol (GL) as organic reactants. Saturated growth could be achieved at 2 to 3 Å/cycle in a wide temperature window from 100 to 250 °C. The resulting magnesicone films react with ambient air and exhibit water uptake, which is in the case of the GL-based films associated with swelling (up to 10%) and in the case of EG-based magnesicone with Mg(CO)3 formation, and are overcoatable with an ALD of Al2O3. Furthermore, by carefully tuning the annealing rate, the EG-grown films can be made porous at 350 °C. Hence, these functional tests demonstrate the potential of magnesicone films as reactive barrier layers and as the porous backbone of lithium ion composite solid electrolytes, making it a promising material for future applications.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Semiconductor materials and devices · Catalytic Processes in Materials Science · Ferroelectric and Piezoelectric Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Solid State Sciences, Ghent University, Krijgslaan 281 (S1), 9000 Gent, Belgium
imec, Kapeldreef 75, B-3001 Leuven, Belgium
Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, T12R5CP Cork, Ireland
M2S Department, Centre for Surface Chemistry and Catalysis, KU-Leuven (Leuven University), Kasteelpark Arenberg 23, B-3001 Leuven, Belgium
Funding
Fonds Wetenschappelijk Onderzoek · Bijzonder Onderzoeksfonds
References (96)
Show source-provided references
1. 10.1063/1.194072710.1063/1.1940727 ↗
2. 10.1021/cr900056b10.1021/cr900056b ↗
3. 10.1016/s0040-6090(02)00117-710.1016/s0040-6090(02)00117-7 ↗
4. 10.1021/jp953676310.1021/jp9536763 ↗
5. 10.1063/1.475790710.1063/1.4757907 ↗
6. 10.1116/1.485167610.1116/1.4851676 ↗
7. 10.1021/jp508828810.1021/jp5088288 ↗
8. 10.1039/c1cs15091j10.1039/c1cs15091j ↗
9. 10.1149/1.307269410.1149/1.3072694 ↗
10. 10.1063/1.506096710.1063/1.5060967 ↗
11. Nilsen, O.; Klepper, K.; Nielsen, H.; Fjellvaåg, H. Deposition of Organic- Inorganic Hybrid Materials by Atomic Layer Deposition. ECS Transactions, 2008; Vol. 16, pp 3–14.10.1149/1.2979975 ↗
12. 10.3762/bjnano.5.12310.3762/bjnano.5.123 ↗
13. 10.1166/jnn.2011.503410.1166/jnn.2011.5034 ↗
14. Nilsen, O.; Fjellvag, H. Thin films prepared with gas phase deposition technique. U.S. Patent 8,124,179 B2, February 28, 2012.
15. 10.1021/cm703297710.1021/cm7032977 ↗
16. 10.1021/cm300162v10.1021/cm300162v ↗
17. 10.1039/c5dt03840e10.1039/c5dt03840e ↗
18. 10.1021/cm802040310.1021/cm8020403 ↗
19. 10.1002/cvde.20080675610.1002/cvde.200806756 ↗
20. 10.1007/s11837-014-0933-z10.1007/s11837-014-0933-z ↗
21. 10.1002/cvde.20120704510.1002/cvde.201207045 ↗
22. 10.1021/am504341r10.1021/am504341r ↗
23. 10.1039/c6dt00851h10.1039/c6dt00851h ↗
24. 10.1002/adfm.20190412910.1002/adfm.201904129 ↗
25. 10.1039/c7dt00374a10.1039/c7dt00374a ↗
26. 10.1116/1.503886710.1116/1.5038867 ↗
27. 10.1039/c7ta04449f10.1039/c7ta04449f ↗
28. 10.1002/adfm.20120037010.1002/adfm.201200370 ↗
29. 10.1016/j.tsf.2016.12.05510.1016/j.tsf.2016.12.055 ↗
30. 10.1021/jp209003h10.1021/jp209003h ↗
31. 10.1039/c5tc03201f10.1039/c5tc03201f ↗
32. 10.1021/acs.chemmater.6b0249610.1021/acs.chemmater.6b02496 ↗
33. 10.1039/c8dt00723c10.1039/c8dt00723c ↗
34. 10.1016/j.tsf.2013.11.07210.1016/j.tsf.2013.11.072 ↗
35. 10.1088/0268-1242/26/3/03400110.1088/0268-1242/26/3/034001 ↗
36. 10.1063/1.192359010.1063/1.1923590 ↗
37. 10.1016/j.memsci.2018.11.07510.1016/j.memsci.2018.11.075 ↗
38. 10.1016/j.memsci.2018.11.01310.1016/j.memsci.2018.11.013 ↗
39. 10.1021/es100255510.1021/es1002555 ↗
40. 10.1021/cr960406n10.1021/cr960406n ↗
41. 10.1021/cm300054b10.1021/cm300054b ↗
42. 10.1002/ange.20170360910.1002/ange.201703609 ↗
43. 10.1002/chem.20130468910.1002/chem.201304689 ↗
44. 10.1016/j.apcata.2008.03.01110.1016/j.apcata.2008.03.011 ↗
45. 10.1016/j.bios.2018.01.00610.1016/j.bios.2018.01.006 ↗
46. 10.1016/j.snb.2018.10.12110.1016/j.snb.2018.10.121 ↗
47. 10.1016/s1387-1811(02)00316-510.1016/s1387-1811(02)00316-5 ↗
48. 10.1126/sciadv.aau047610.1126/sciadv.aau0476 ↗
49. 10.1002/ppsc.20180033110.1002/ppsc.201800331 ↗
50. 10.1039/c3ta13678g10.1039/c3ta13678g ↗
51. 10.1002/adma.20150198310.1002/adma.201501983 ↗
52. 10.1021/acs.accounts.5b0011710.1021/acs.accounts.5b00117 ↗
53. 10.1016/j.jelechem.2018.10.00110.1016/j.jelechem.2018.10.001 ↗
54. 10.1002/adfm.20070083210.1002/adfm.200700832 ↗
55. 10.1002/adtp.20180009510.1002/adtp.201800095 ↗
56. 10.1021/acs.nanolett.8b0417010.1021/acs.nanolett.8b04170 ↗
57. 10.1016/j.cclet.2018.05.01610.1016/j.cclet.2018.05.016 ↗
58. 10.1149/1.135939610.1149/1.1359396 ↗
59. 10.1016/j.electacta.2018.11.11910.1016/j.electacta.2018.11.119 ↗
60. 10.1039/b911888h10.1039/b911888h ↗
61. 10.1016/j.micromeso.2012.09.03510.1016/j.micromeso.2012.09.035 ↗
62. 10.1002/admi.20160087710.1002/admi.201600877 ↗
63. 10.1016/0022-3697(85)90172-610.1016/0022-3697(85)90172-6 ↗
64. 10.1023/a:100990610142110.1023/a:1009906101421 ↗
65. 10.1038/nmat151310.1038/nmat1513 ↗
66. 10.1070/rc2007v076n05abeh00368710.1070/rc2007v076n05abeh003687 ↗
67. 10.1134/s102319351007002510.1134/s1023193510070025 ↗
68. 10.1007/s10008-008-0739-410.1007/s10008-008-0739-4 ↗
69. 10.1002/admi.20180089910.1002/admi.201800899 ↗
70. 10.1002/aenm.20160140210.1002/aenm.201601402 ↗
71. 10.1002/advs.20160051710.1002/advs.201600517 ↗
72. 10.1149/2.0371714jes10.1149/2.0371714jes ↗
73. 10.1002/chem.20190103410.1002/chem.201901034 ↗
74. 10.1002/chem.20170370410.1002/chem.201703704 ↗
75. Fairley, N. Casa Software Ltd, 2018, www.casaxps.com (accessed March 24, 2020).
76. 10.1116/1.59139010.1116/1.591390 ↗
77. 10.1021/la300045z10.1021/la300045z ↗
78. 10.1016/s0167-9317(02)00807-910.1016/s0167-9317(02)00807-9 ↗
79. 10.1039/c8dt01246f10.1039/c8dt01246f ↗
80. 10.1103/physrevb.54.1116910.1103/physrevb.54.11169 ↗
81. 10.1103/physrevb.50.1795310.1103/physrevb.50.17953 ↗
82. 10.1103/physrevb.59.175810.1103/physrevb.59.1758 ↗
83. 10.1103/physrevlett.77.386510.1103/physrevlett.77.3865 ↗
84. 10.1103/physrevb.13.518810.1103/physrevb.13.5188 ↗
85. 10.1116/1.493722210.1116/1.4937222 ↗
86. 10.1021/jp308828p10.1021/jp308828p ↗
87. 10.1039/c3tc30271g10.1039/c3tc30271g ↗
88. 10.1021/la102649x10.1021/la102649x ↗
89. Nilsen, O. The reservoir effect and its implications. Presented at ALD 2015, 15th International Conference on Atomic Layer Deposition, Portland, Oregon, USA, July 1–2, 2015, https://www.pathlms.com/avstechnicallibrary/events/399/slidepresentations/15083 (accessed Jan 10, 2020).
90. 10.1021/jp806088m10.1021/jp806088m ↗
91. 10.1021/acs.chemmater.8b0146810.1021/acs.chemmater.8b01468 ↗
92. 10.1116/1.509350910.1116/1.5093509 ↗
93. 10.1016/s0039-6028(01)01906-910.1016/s0039-6028(01)01906-9 ↗
94. 10.1111/j.1151-2916.1965.tb14765.x10.1111/j.1151-2916.1965.tb14765.x ↗
95. 10.1007/s00216-016-9411-510.1007/s00216-016-9411-5 ↗
96. 10.1039/tf967630276910.1039/tf9676302769 ↗