journal article·2017-05-09

Chemical Protection of Material Morphology: Robust and Gentle Gas-Phase Surface Functionalization of ZnO with Propiolic Acid

Fei Gao, Soraya Aminane, Shi Bai, Andrew V. Teplyakov

Chemistry of Materials· Volume 29· Issue 9
Publisher page

Abstract

Chemical functionalization of ZnO surface with an alkyne functional group was successfully achieved by exposing ZnO nanopowder to gas-phase propiolic acid in vacuum, which left the alkyne group available for subsequent chemical modification via the azide-alkyne cycloaddition "click" reaction with benzyl azide. The highly selective formation of a bidentate carboxylate linkage and the reaction of benzyl azide were confirmed by solid-state nuclear magnetic resonance spectroscopy, Fourier-transform infrared spectroscopy, and X-ray photoelectron spectroscopy. Most importantly, scanning electron microscopy revealed that the surface morphology was perfectly preserved by this gas-phase modification, as opposed to the alternative protocols based on liquid phase processing. This simple and precise design can serve as a universal method for the modular functionalization of zinc oxide surface following the initial surface preparation and be further applied to thin films, nanostructures, and powders, where preserving surface morphology during chemical modification is especially important.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Copper-based nanomaterials and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716, United States

Université Pierre et Marie Curie, Paris Cedex 05 75005, France

Funding

Division of Chemistry · American Chemical Society Petroleum Research Fund · National Institute of General Medical Sciences · Division of Materials Research

References (51)

Show source-provided references
1. 10.1021/la204145t10.1021/la204145t ↗
2. 10.1038/nmat138710.1038/nmat1387 ↗
3. 10.1063/1.199266610.1063/1.1992666 ↗
4. 10.1021/la400694910.1021/la4006949 ↗
5. 10.1016/S1010-6030(02)00039-410.1016/S1010-6030(02)00039-4 ↗
6. 10.1021/jp108014310.1021/jp1080143 ↗
7. 10.1021/la802694610.1021/la8026946 ↗
8. 10.1021/la800074f10.1021/la800074f ↗
9. 10.1021/la904282710.1021/la9042827 ↗
10. 10.1039/c0jm02829k10.1039/c0jm02829k ↗
11. 10.1039/b712721a10.1039/b712721a ↗
12. 10.1021/acs.jpcc.6b0350210.1021/acs.jpcc.6b03502 ↗
13. Greenwood N. N. · 1997
14. Ferracane J. L. · 2001
15. 10.1002/adma.20150340410.1002/adma.201503404 ↗
16. 10.1063/1.496449010.1063/1.4964490 ↗
17. Rusli, N. I.; Abdulgafour, H.; Hassan, Z.; Yam, F. K.; Ali, N. K.; Hashim, A. M.; Mahmood, M. R.; Nayan, N.InZnO Nanostructures Grown on Porous Silicon Substrate without Catalyst,2012 International Conference on Enabling Science and Nanotechnology, January 5–7, 2012; pp1–2.10.1109/ESciNano.2012.6149704 ↗
18. 10.1016/S1369-7021(07)70078-010.1016/S1369-7021(07)70078-0 ↗
19. 10.1021/jp203590p10.1021/jp203590p ↗
20. 10.1021/ja312303a10.1021/ja312303a ↗
21. 10.1116/1.158952910.1116/1.1589529 ↗
22. 10.1021/jp409902c10.1021/jp409902c ↗
23. 10.1073/pnas.070709010410.1073/pnas.0707090104 ↗
24. 10.1002/1521-3773(20020715)41:14<2596::AID-ANIE2596>3.0.CO;2-410.1002/1521-3773(20020715)41:14<2596::AID-ANIE2596>3.0.CO;2-4 ↗
25. 10.1021/jp010287210.1021/jp0102872 ↗
26. 10.1021/jp010284p10.1021/jp010284p ↗
27. 10.1016/S0008-6223(03)00170-210.1016/S0008-6223(03)00170-2 ↗
28. 10.1021/es803431c10.1021/es803431c ↗
29. Frisch, M. J.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.; Robb, M. A.; Cheeseman, J. R.; Scalmani, G.; Barone, V.; Mennucci, B.; Petersson, G. A.; Nakatsuji, H.; Caricato, M.; Li, X.; Hratchian, H. P.; Izmaylov, A. F.; Bloino, J.; Zheng, G.; Sonnenberg, J. L.; Hada, M.; Ehara, M.; Toyota, K.; Fukuda, R.; Hasegawa, J.; Ishida, M.; Nakajima, T.; Honda, Y.; Kitao, O.; Nakai, H.; Vreven, T.; Montgomery, J. A., Jr.; Peralta, J. E.; Ogliaro, F.; Bearpark, M.; Heyd, J. J.; Brothers, E.; Kudin, K. N.; Staroverov, V. N.; Kobayashi, R.; Normand, J.; Raghavachari, K.; Rendell, A.; Burant, J. C.; Iyengar, S. S.; Tomasi, J.; Cossi, M.; Rega, N.; Millam, J. M.; Klene, M.; Knox, J. E.; Cross, J. B.; Bakken, V.; Adamo, C.; Jaramillo, J.; Gomperts, R.; Stratmann, R. E.; Yazyev, O.; Austin, A. J.; Cammi, R.; Pomelli, C.; Ochterski, J. W.; Martin, R. L.; Morokuma, K.; Zakrzewski, V. G.; Voth, G. A.; Salvador, P.; Dannenberg, J. J.; Dapprich, S.; Daniels, A. D.; Farkas, O.; Foresman, J. B.; Ortiz, J. V.; Cioslowski, J.; Fox, D. J.Gaussian 09, revision B.01;Gaussian, Inc.:Wallingford, CT, 2009.
30. 10.1103/PhysRevB.37.78510.1103/PhysRevB.37.785 ↗
31. 10.1063/1.46430410.1063/1.464304 ↗
32. 10.1063/1.43898010.1063/1.438980 ↗
33. 10.1063/1.43895510.1063/1.438955 ↗
34. 10.1021/acs.langmuir.6b0006110.1021/acs.langmuir.6b00061 ↗
35. 10.1021/jp902259710.1021/jp9022597 ↗
36. 10.1016/j.progsurf.2006.12.00210.1016/j.progsurf.2006.12.002 ↗
37. 10.1016/j.jcat.2012.12.02610.1016/j.jcat.2012.12.026 ↗
38. 10.1016/j.jcat.2014.08.01410.1016/j.jcat.2014.08.014 ↗
39. 10.1021/jp057031710.1021/jp0570317 ↗
40. 10.1021/la991270210.1021/la9912702 ↗
41. 10.1021/ja106091q10.1021/ja106091q ↗
42. 10.1016/j.susc.2015.08.00610.1016/j.susc.2015.08.006 ↗
43. 10.1021/jp508219y10.1021/jp508219y ↗
44. 10.1021/am402398h10.1021/am402398h ↗
45. 10.1016/j.apsusc.2015.11.21210.1016/j.apsusc.2015.11.212 ↗
46. 10.1021/jp406021z10.1021/jp406021z ↗
47. 10.1016/j.ccr.2011.06.02810.1016/j.ccr.2011.06.028 ↗
48. 10.1021/la701035g10.1021/la701035g ↗
49. Jacobsen F. E. · 2007
50. 10.1021/ic025806+10.1021/ic025806+ ↗
51. 10.1021/jo301265t10.1021/jo301265t ↗