journal article·2009-05-26

Synthesis, Characterization, and Mass Transport Properties of a Self-Generating Single-Source Magnesium Precursor for MOCVD of MgF2Films

Maria E. Fragalà, Roberta G. Toro, Patrizia Rossi, Paolo Dapporto, Graziella Malandrino

Chemistry of Materials· Volume 21· Issue 10
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Abstract

The diglyme [CH 3 O(CH 2 CH 2 O) 2 CH 3 ] adduct of the magnesium bis-hexafluoroacetyl-acetonato [Mg(hfa) 2 ·2H 2 O·2diglyme] has been synthesized in a single-step reaction. It has been characterized by elemental analyses, IR spectroscopy, and 1 H and 13 C NMR. Single-crystal X-ray diffraction studies provide evidence of a mononuclear hexa-coordinated complex with an octahedral structure for the Mg(hfa) 2 ·2H 2 O moiety and diglyme coordinated in the outer sphere (triclinic system, space group= P 1̅; a = 8.952(3) Å, b = 9.036(3) Å, c = 11.98(1) Å, α = 110.44(5)°, β = 108.64(4)°, γ = 97.06(3)°, Z = 1). The “thermal robustness” and mass transport properties of the adduct have been investigated by thermogravimetric analysis and chemical vapor deposition experiments. Thermal analysis data revealed high volatility and good thermal stability with a residue left lower than 1%. The Mg(hfa) 2 ·2H 2 O·2diglyme has been successfully applied to the low-pressure metal-organic chemical vapor deposition (MOCVD) of MgF 2 films. The good quality of the deposited films indicates that the adduct is a very attractive single-source precursor for deposition of MgF 2 films.
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Research context

OpenAlex topics: Inorganic Fluorides and Related Compounds · Semiconductor materials and devices · Magnesium Oxide Properties and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Dipartimento di Scienze Chimiche, Università di Catania, and INSTM, UdR Viale Andrea Doria 6, 95125 Catania, Italy, INSTM, Centro di Riferimento “Materiali nanodimensionati per microelettronica e settori correlati”, c/o Dipartimento Scienze Chimiche, Università di Catania, Viale A. Doria 6, 95125 Catania, Italy, and Dipartimento di Energetica “S. Stecco”, Università di Firenze, Via Santa Marta 3, 50136 Firenze, Italy

References (54)

Show source-provided references
1. Belanger D. P. · Phys. Rev. B: Condens. Matter · 1984 · 29 · 263610.1103/PhysRevB.29.2636 ↗
2. Fukumoto E. · Trends Opt. Photonics · 2001 · 63 · TuF9/1
3. Larruquert J. I. · Opt. Commun. · 2003 · 215 · 9310.1016/S0030-4018(02)02229-0 ↗
4. Perales F. · Opt. Mater. · 2007 · 29 · 78310.1016/j.optmat.2006.01.001 ↗
5. Gunster S. · Trends Opt. Photonics · 2001 · 63 · ME9/1
6. Li B. · Appl. Phys. A: Mater. Sci. Process. · 2002 · 74 · 2710.1007/s003390100867 ↗
7. Czigany Zs. · Thin Solid Films · 1998 · 312 · 17610.1016/S0040-6090(97)00729-3 ↗
8. Woo S.-H. · Surf. Coat. Technol. · 2007 · 201 · 825010.1016/j.surfcoat.2006.01.085 ↗
9. Thomas I. M. · Appl. Opt. · 1988 · 27 · 335610.1364/AO.27.003356 ↗
10. Jacob D. · Thin Solid Films · 2000 · 360 · 13310.1016/S0040-6090(99)00738-5 ↗
11. Murata T. · Appl. Opt. · 2008 · 47 · C24610.1364/AO.47.00C246 ↗
12. Krueger H. · Thin Solid Films · 2008 · 516 · 417510.1016/j.tsf.2007.10.126 ↗
13. Bass J. D. · Chem. Mater. · 2008 · 20 · 555010.1021/cm8010106 ↗
14. Rywak A. A. · Chem. Mater. · 1996 · 8 · 6010.1021/cm950109j ↗
15. Pilvi T. · Chem. Mater. · 2008 · 20 · 502310.1021/cm800948k ↗
16. Pilvi T. · J. Mater. Chem. · 2007 · 17 · 507710.1039/b710903b ↗
17. Pilvi T. · Appl. Opt. · 2008 · 47 · C27110.1364/AO.47.00C271 ↗
18. Hitchman M. L. · 1993
19. Wang L. · Chem. Mater. · 2005 · 17 · 569710.1021/cm0512528 ↗
20. Carta G. · Chem. Vap. Deposition · 2007 · 13 · 18510.1002/cvde.200606574 ↗
21. Boo J.-H. · Thin Solid Films · 1999 · 341 · 6310.1016/S0040-6090(98)01524-7 ↗
22. Matthews J. S. · Chem. Vap. Deposition · 2000 · 6 · 12910.1002/(SICI)1521-3862(200006)6:3<129::AID-CVDE129>3.0.CO;2-X ↗
23. Hill M. R. · J. Mater. Chem. · 2004 · 14 · 319810.1039/b405816j ↗
24. Davies H. O. · Chem. Vap. Deposition · 2000 · 6 · 7110.1002/(SICI)1521-3862(200004)6:2<71::AID-CVDE71>3.0.CO;2-# ↗
25. Hatanpaa T. · Inorg. Chem. · 2001 · 40 · 78810.1021/ic000310i ↗
26. Zheng Y. · Mater. Res. Bull. · 2009 · 44 · 77510.1016/j.materresbull.2008.09.021 ↗
27. Datta P. · Mater. Chem. Phys. · 2009 · 114 · 35610.1016/j.matchemphys.2008.09.038 ↗
28. Ghosh S. · J. Am. Ceram. Soc. · 2007 · 90 · 374110.1111/j.1551-2916.2007.01987.x ↗
29. Malandrino G. · Inorg. Chim. Acta · 1994 · 224 · 20310.1016/0020-1693(94)04123-7 ↗
30. Malandrino G. · Chem. Vap. Deposition · 2006 · 12 · 73610.1002/cvde.200606504 ↗
31. Lo Nigro R. · J. Electrochem. Soc. · 2004 · 151 · F20610.1149/1.1779336 ↗
32. Lo Nigro R. · J. Mater. Chem. · 2002 · 12 · 281610.1039/B201716B ↗
33. Malandrino G. · Chem. Mater. · 1998 · 10 · 343410.1021/cm980172j ↗
34. Malandrino G. · J. Chem. Soc., Dalton Trans. · 1998 · 150910.1039/a708770e ↗
35. Malandrino G. · Chem. Mater. · 1996 · 8 · 129210.1021/cm950569c ↗
36. Malandrino G. · Coord. Chem. Rev. · 2006 · 250 · 160510.1016/j.ccr.2006.03.017 ↗
37. Hitchman M. L. · J. Mater. Chem. · 1995 · 5 · 4710.1039/jm9950500047 ↗
38. Walker N. · Acta Crystallogr., Sect. A, · 1983 · 39 · 15810.1107/S0108767383000252 ↗
39. Altomare A. · J. Appl. Crystallogr. · 1994 · 27 · 435
40. Sheldrick G. M. · 1997
41. 1974
42. Nardelli M. · Comput. Chem. · 1993 · 7 · 9510.1016/0097-8485(83)85001-3 ↗
43. Farrugia L. J. · J. Appl. Crystallogr. · 1997 · 30 · 56510.1107/S0021889897003117 ↗
44. Timmer K. · Inorg. Chim. Acta · 1991 · 190 · 10910.1016/S0020-1693(00)80239-X ↗
45. Malandrino G. · J. Mater. Chem. · 1994 · 4 · 106110.1039/JM9940401061 ↗
46. Neumayer D. A. · Chem. Mater. · 1994 · 6 · 87810.1021/cm00043a002 ↗
47. Belot J. A. · Chem. Mater. · 1997 · 9 · 163810.1021/cm9700108 ↗
48. Otaway D. J. · Coord. Chem. Rev. · 2000 · 210 · 27910.1016/S0010-8545(00)00360-X ↗
49. Gulino A. · Chem. Mater. · 2003 · 15 · 374810.1021/cm034305z ↗
50. Gulino A. · Chem. Mater. · 2000 · 12 · 54810.1021/cm991154k ↗
51. Kuz’mina N. P. · Russ. J. Coord.Chem. · 1999 · 25 · 383
52. Condorelli G. G. · Chem. Vap. Deposition · 2001 · 7 · 15110.1002/1521-3862(200107)7:4<151::AID-CVDE151>3.0.CO;2-C ↗
53. Condorelli G. G. · Chem. Vap. Deposition · 2000 · 6 · 18510.1002/1521-3862(200008)6:4<185::AID-CVDE185>3.0.CO;2-M ↗
54. Siddiqi M. A. · Thermochim. Acta · 2007 · 452 · 1210.1016/j.tca.2006.10.021 ↗