Atomic Layer Deposition of Aluminum Metal Films Using a Thermally Stable Aluminum Hydride Reducing Agent

ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTAtomic Layer Deposition of Aluminum Metal Films Using a Thermally Stable Aluminum Hydride Reducing AgentKyle J. BlakeneyKyle J. BlakeneyDepartment of Chemistry, Wayne State University, 5101 Cass Avenue, Detroit, Michigan 48202, United StatesMore by Kyle J. Blakeneyhttp://orcid.org/0000-0002-0375-0056 and Charles H. Winter*Charles H. WinterDepartment of Chemistry, Wayne State University, 5101 Cass Avenue, Detroit, Michigan 48202, United States*C. H. Winter. E-mail: [email protected]More by Charles H. Winterhttp://orcid.org/0000-0003-0416-1234Cite this: Chem. Mater. 2018, 30, 6, 1844–1848Publication Date (Web):March 12, 2018Publication History Received30 January 2018Revised9 March 2018Published online12 March 2018Published inissue 27 March 2018https://pubs.acs.org/doi/10.1021/acs.chemmater.8b00445https://doi.org/10.1021/acs.chemmater.8b00445rapid-communicationACS PublicationsCopyright © 2018 American Chemical SocietyRequest reuse permissionsArticle Views3611Altmetric-Citations29LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-AlertscloseSupporting Info (1)»Supporting Information Supporting Information SUBJECTS:Atomic layer deposition,Chemical vapor deposition,Crystallization,Metals,Thin films Get e-Alerts