Controlled Dopant Distribution and Higher Doping Efficiencies by Surface-Functionalized Atomic Layer Deposition
Source abstract
Abstract
Reversible surface functionalization allows control of the precursor saturation coverage and growth per cycle in atomic layer deposition. Functionalizing the ZnO surface with alkyl alcohols, we achieve 2× higher doping efficiencies in Al-doped ZnO compared to conventional atomic layer deposition because of the more efficient dopant distribution in the ZnO host
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Semiconductor materials and devices · ZnO doping and properties · Electronic and Structural Properties of Oxides
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Energy Systems Division, Argonne National Laboratory, 9700 South Cass Avenue, Argonne Illinois 60439, United States
References (19)
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