journal article·2011-10-25

Aligned Rectangular Few-Layer Graphene Domains on Copper Surfaces

Yimin A. Wu, Alex W. Robertson, Franziska Schäffel, Susannah C. Speller, Jamie H. Warner

Chemistry of Materials· Volume 23· Issue 20
Publisher page

Abstract

We show that aligned rectangular few layer graphene (FLG) domains can be produced on Cu surfaces using atmospheric pressure chemical vapor deposition. For the growth temperatures of 990 and 1000 °C the FLG domains are primarily hexagonal in shape, but at 980 °C, morphology transition of FLG domains is observed associated with different Cu grains. Rectangular FLG domains are synthesized for the first time and we show using electron backscattered diffraction that they only grow on Cu grains with (111) orientation because of the interplay between the atomic structure of the Cu lattice and the graphene domains. We show that hexagonal FLG domains can form on nearly all other non-(111) Cu surfaces. These results indicate that even at atmospheric pressure, the interplay between the Cu atomic structure and graphene formation can be strong and lead to aligned rectangular domains.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Graphene research and applications · Surface and Thin Film Phenomena · Quantum and electron transport phenomena

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom

References (24)

Show source-provided references
1. Novoselov K. S. · Science · 2004 · 306 · 66610.1126/science.1102896 ↗
2. Lemme M. C. · IEEE Electron Device Lett. · 2007 · 28 · 28210.1109/LED.2007.891668 ↗
3. Meric I. · 2008
4. Schwierz F. · Nat. Nanotechnol. · 2010 · 5 · 48710.1038/nnano.2010.89 ↗
5. Kim K. S. · Nature · 2009 · 457 · 70610.1038/nature07719 ↗
6. Bae S. · Nat. Nanotechnol. · 2010 · 5 · 57410.1038/nnano.2010.132 ↗
7. Li X. · Nano Lett. · 2009 · 9 · 435910.1021/nl902623y ↗
8. Li X. · Science · 2009 · 324 · 131210.1126/science.1171245 ↗
9. Wofford J. M. · Nano Lett. · 2010 · 10 · 489010.1021/nl102788f ↗
10. Li X. · J. Am. Chem. Soc. · 2011 · 133 · 281610.1021/ja109793s ↗
11. Lee S. · Nano Lett. · 2010 · 10 · 470210.1021/nl1029978 ↗
12. Yan K. · Nano Lett. · 2011 · 11 · 110610.1021/nl104000b ↗
13. Li X. · Nano Lett. · 2009 · 9 · 426810.1021/nl902515k ↗
14. Li X. · Nano Lett. · 2010 · 10 · 432810.1021/nl101629g ↗
15. Reina A. · Nano Lett. · 2009 · 9 · 3010.1021/nl801827v ↗
16. Bhaviripudi S. · Nano Lett. · 2010 · 10 · 412810.1021/nl102355e ↗
17. Yao Y. · J. Phys. Chem. C · 2011 · 115 · 523210.1021/jp109002p ↗
18. Luo Z. · Chem. Mater. · 2011 · 23 · 144110.1021/cm1028854 ↗
19. Rasool H. I. · Nano Lett. · 2011 · 11 · 25110.1021/nl1036403 ↗
20. Gao L. · Nano Lett. · 2010 · 10 · 351210.1021/nl1016706 ↗
21. Zhao L. · Solid State Commun. · 2011 · 151 · 50910.1016/j.ssc.2011.01.014 ↗
22. Robertson A. W. · Nano Lett. · 2011 · 11 · 118210.1021/nl104142k ↗
23. Bi H. · Adv. Mater. · 2011 · 23 · 320210.1002/adma.201100645 ↗
24. Vlassiouk I. · ACS Nano · 2011 · 5 · 606910.1021/nn201978y ↗