Transparent Micrometer-Thick TiO2 Films on SiO2-Coated Glass Prepared by Repeated Dip-Coating/Calcination: Characteristics and Photocatalytic Activities for Removing Acetaldehyde or Toluene in Air
Source abstract
Abstract
TiO 2 films on silica-coated glass plates were obtained through dip-coating and subsequent calcination at 753 K; this temperature and the proportions of the dip-coating solution components (tetraisopropyl orthotitanate, ethoxyethoxyethanol, propan-2-ol, α-terpineol, and a hydroxypropyl cellulose) were optimized. Depending on the number N (5 ≤ N ≤ 30) of dip-coating/calcination procedures, the films characteristics were hardness, >9 H; thickness, 0.9−5.4 μm; transmitted light, ca. 70% (visible spectral region); absorbed light, 90−100% at 358 nm; surface area, 40−80 m 2 g - 1; pore volume 7−20 mL g - 1; anatase particle size, 3.5−4 nm (elemental crystallites) and 12−16 nm (agglomerates). These tiny sizes, which did not increase for N ≥ 20, were obtained because of the use of hydroxypropyl cellulose. The photocatalytic removal rate of acetaldehyde (3.25 ppmv) or toluene (1 ppmv) in flowing air (50% RH) showed that the TiO 2 minimum amount varied with the pollutant and that a 1−2 μm thickness was sufficient to achieve a near-maximum efficacy. In summary, this preparation produces anatase films having the mechanical, optical, and photocatalytic properties required to obtain self-cleaning (water contact angle test) and air depolluting (at least in relatively confined spaces) glass without using a binder, which can restrict the accessibility to TiO 2 and alter the photocatalytic activity.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: TiO2 Photocatalysis and Solar Cells · Advanced Photocatalysis Techniques · Catalytic Processes in Materials Science
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Research Institute for Environmental Management Technology, National Institute of Advanced Industrial Science and Technology (AIST), 16-1 Onogawa, Tsukuba 305-8569, Japan, and Photocatalyse et Environment, Centre National de la Recherche Scientifique (CNRS)/Ecole de Centrale de Lyon, 69134 Ecully, France
References (44)
Show source-provided references
1. Heller A. · Acc. Chem. Res. · 1995 · 28 · 50310.1021/ar00060a006 ↗
2. Paz Y. · J. Mater. Res. · 1995 · 10 · 284210.1557/JMR.1995.2842 ↗
3. Sitkiewitz S. · New J. Chem. · 1996 · 20 · 233
4. Romeas V. · New J. Chem. · 1999 · 23 · 36510.1039/a901342c ↗
5. Romeas V. · Ind. Eng. Chem. Res. · 1999 · 38 · 387810.1021/ie990326k ↗
6. Tryk D. A. · Electrochim. Acta · 2000 · 45 · 236310.1016/S0013-4686(00)00337-6 ↗
7. Puzenat E. · J. Photochem. Photobiol., A · 2003 · 160 · 12710.1016/S1010-6030(03)00231-4 ↗
8. Mills A. · J. Photochem. Photobiol., A · 2003 · 160 · 21310.1016/S1010-6030(03)00205-3 ↗
9. Guan K. · Surf. Coat. Technol. · 2005 · 191 · 15510.1016/j.surfcoat.2004.02.022 ↗
10. Parkin I. P. · J. Mater. Chem. · 2005 · 15 · 168910.1039/b412803f ↗
11. Zhang X. · Chem. Mater. · 2005 · 17 · 69610.1021/cm0484201 ↗
12. Watanabe T. · Thin Solid Films · 1999 · 351 · 26010.1016/S0040-6090(99)00205-9 ↗
13. Takeuchi, K.; Negishi, N.; Kutsuna, S.; Ibusuki, T. InProceedings ofMaterials Solutions for Environmental Problems; Mostaghaci, H., Ed.; Canadian Institute of Mining, Metallurgy and Petroleum: Ottawa, Canada, 1997; p 162.
14. Takeuchi K. · Sci. Avenir · 2001 · 70
15. Negishi N. · J. Mater. Sci. · 1998 · 33 · 578910.1023/A:1004441829285 ↗
16. Yu J. · Mater. Chem. Phys. · 2001 · 69 · 2510.1016/S0254-0584(00)00291-1 ↗
17. Kominami H. · Appl. Catal., B · 2001 · 30 · 32910.1016/S0926-3373(00)00245-9 ↗
18. Avila P. · Appl. Catal., B · 1998 · 17 · 7510.1016/S0926-3373(97)00104-5 ↗
19. Minabe T. · J. Photochem. Photobiol., A · 2000 · 137 · 5310.1016/S1010-6030(00)00350-6 ↗
20. Negishi N. · Chem. Lett. · 1995 · 841
21. Kato K. · J. Mater. Sci. · 1995 · 30 · 83710.1007/BF00356349 ↗
22. Yoko T. · Thin Solid Films · 1996 · 283 · 18810.1016/0040-6090(95)08222-0 ↗
23. Sunada K. · Environ. Sci. Technol. · 1998 · 32 · 72610.1021/es970860o ↗
24. Negishi N. · J. Mater. Sci. Lett. · 1999 · 18 · 51510.1023/A:1006649722543 ↗
25. Negishi N. · Mater. Lett. · 1999 · 38 · 15010.1016/S0167-577X(98)00150-5 ↗
26. Yan Y. · J. Am. Ceram. Soc. · 1996 · 79 · 106110.1111/j.1151-2916.1996.tb08548.x ↗
27. Renous-Chan V. · 1997
28. Kwon C. · Ceram. Int. · 2003 · 29 · 85110.1016/S0272-8842(03)00019-1 ↗
29. Enriquez R. · Water Sci. Technol. · 2004 · 49 · 14710.2166/wst.2004.0246 ↗
30. Negishi N. · Thin Solid Films · 2001 · 392 · 24910.1016/S0040-6090(01)01036-7 ↗
31. Smirnova N. · J. Sol−Gel Sci. Technol. · 2004 · 32 · 35710.1007/s10971-004-5817-1 ↗
32. Liu X. · J. Sol−Gel Sci. Technol. · 2005 · 36 · 10310.1007/s10971-005-2746-6 ↗
33. Lee D. S. · J. Sol−Gel Sci. Technol. · 2002 · 25 · 12110.1023/A:1019960211745 ↗
34. Negishi N. · Res. Chem. Intermed. · 2003 · 29 · 86110.1163/156856703322601861 ↗
35. Yoldas B. E. · Thin Solid Films · 1985 · 129 · 110.1016/0040-6090(85)90089-6 ↗
36. Kumar K. P. · J. Mater. Chem. · 1993 · 3 · 114110.1039/JM9930301141 ↗
37. Gotic M. · Mater. Lett. · 1996 · 28 · 22510.1016/0167-577X(96)00061-4 ↗
38. Kim K. D. · Powder Technol. · 2001 · 119 · 16410.1016/S0032-5910(00)00420-4 ↗
39. Fang C. S. · Mater. Chem. Phys. · 2003 · 78 · 73910.1016/S0254-0584(02)00416-9 ↗
40. Mohammadi M. R. · Sens. Actuators, B · 2006 · 120 · 8610.1016/j.snb.2006.01.046 ↗
41. Nagpal V. J. · Colloids Surf., A · 1994 · 87 · 2510.1016/0927-7757(93)02735-W ↗
42. Sano T. · Sol. Energy · 2004 · 77 · 54310.1016/j.solener.2004.03.018 ↗
43. Muggli D. S. · Appl. Catal., B · 2001 · 32 · 18110.1016/S0926-3373(01)00137-0 ↗
44. Hennezel O. · J. Photochem. Photobiol., A · 1998 · 118 · 19710.1016/S1010-6030(98)00366-9 ↗