Contact Area Lithography (CAL): A New Approach to Direct Formation of Nanometric Chemical Patterns
Source abstract
Abstract
Periodic chemical patterns of octadecyltrichlorosilane self-assembled monolayers were prepared through the realization of patterning using the meniscus in the contacts between spherical colloids and substrates. These patterns served as a passivation layer either in selective atomic layer deposition or in selective wet chemical etching, yielding the periodic surface nanostructures of various inorganic materials.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Molecular Junctions and Nanostructures · Nanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Advanced Materials Engineering, Kookmin University, Seoul 136-702, Korea
School of Advanced Materials Engineering, Yonsei University, Seoul 120-749, Korea
Department of Chemistry, Kookmin University, Seoul 136-702, Korea
References (26)
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