journal article·2008-04-01

Ti5Si3 Nanowire and Its Field Emission Property

Huang-Kai Lin, Yu-Fen Tzeng, Chia-Hsin Wang, Nyan-Hwa Tai, I-Nan Lin, Chi-Young Lee, Hsin-Tien Chiu

Chemistry of Materials· Volume 20· Issue 7
Publisher page

Abstract

Ti5Si3 nanowires (diameter, 20–50 nm; length, several micrometers) on C54-TiSi2 thin films are prepared through a unique chemical vapor deposition process. They show excellent field emission properties, a low turn-on field E0 of 5.4 V/µm, and a high field enhancement factor β of 816.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Nanowire Synthesis and Applications · Semiconductor materials and interfaces · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan 30050, R.O.C., Department of Materials Science and Engineering and Center for Nanotechnology, Materials Science, and Microsystems, National Tsing Hua University, Hsinchu, Taiwan 30043, R.O.C., and Department of Physics, Tamkang University, Taipei, Taiwan 25137, R.O.C.

References (35)

Show source-provided references
1. Cui Y. · Science · 2003 · 293 · 128910.1126/science.1062711 ↗
2. Huang M. H. · Science · 2001 · 292 · 189710.1126/science.1060367 ↗
3. Huang Y. · Science · 2001 · 291 · 63010.1126/science.291.5504.630 ↗
4. Heer W. A. · Science · 1995 · 270 · 117910.1126/science.270.5239.1179 ↗
5. Tzeng Y.-F. · Appl. Phys. Lett. · 2007 · 91 · 06311710.1063/1.2768880 ↗
6. Zhou X.-T. · Chem. Phys. Lett. · 2000 · 318 · 5810.1016/S0009-2614(99)01398-6 ↗
7. Wang C.-H. · Chem. Mater. · 2007 · 19 · 395610.1021/cm070925e ↗
8. Tseng Y.-K. · Adv. Funct. Mater. · 2003 · 13 · 81110.1002/adfm.200304434 ↗
9. Chueh Y.-L. · Nano Lett. · 2006 · 6 · 163710.1021/nl060614n ↗
10. Xiang B. · Appl. Phys. Lett. · 2005 · 86 · 24310310.1063/1.1948515 ↗
11. Du J. · J. Phys. Chem. C · 2007 · 111 · 1081410.1021/jp071019s ↗
12. Seo K. · J. Phys. Chem. C · 2007 · 111 · 907210.1021/jp071707b ↗
13. Szczech J. R. · Chem. Mater. · 2007 · 19 · 323810.1021/cm0707307 ↗
14. Quyang L. · Adv. Mater. · 2006 · 18 · 143710.1002/adma.200502721 ↗
15. Schmitt A. L. · Nano Lett. · 2006 · 6 · 161710.1021/nl060550g ↗
16. Varadwaj K. S. K. · J. Am. Chem. Soc. · 2007 · 129 · 859410.1021/ja071439v ↗
17. Schmitt A. L. · J. Phys. Chem. B · 2006 · 110 · 1814210.1021/jp064646a ↗
18. Seo K. · Nano Lett. · 2007 · 7 · 124010.1021/nl070113h ↗
19. Song Y. · Appl. Phys. Lett. · 2007 · 90 · 17312210.1063/1.2732828 ↗
20. Song Y. · Nano Lett. · 2007 · 7 · 96510.1021/nl0630687 ↗
21. Chen L.-J. · 200410.1049/PBEP005E ↗
22. Bucher E. · Appl. Phys. A: Mater. Sci. Process. · 1986 · 40 · 7110.1007/BF00616480 ↗
23. Maex K. · 1995
24. Murarka S. P. · J. Appl. Phys. · 1980 · 51 · 35010.1063/1.327379 ↗
25. Bennett P. A. · J. Vac. Sci. Technol. B · 2002 · 20 · 250010.1116/1.1525006 ↗
26. Hsu H.-C. · Nano Lett. · 2007 · 7 · 88510.1021/nl062465e ↗
27. Choi S.-S. · Surf. Interface Anal. · 2004 · 36 · 43510.1002/sia.1715 ↗
28. Lee C.-Y. · Chem. Vap. Deposition · 1999 · 5 · 6910.1002/(SICI)1521-3862(199903)5:2<69::AID-CVDE69>3.0.CO;2-O ↗
29. Wagner R. S. · Appl. Phys. Lett. · 1964 · 4 · 8910.1063/1.1753975 ↗
30. Ameen, M. S.; Leusink, G.; Hillman, J. T.U.S. Patent No. 5926737,1999.
31. Reynolds G. J. · J. Appl. Phys. · 1989 · 65 · 321210.1063/1.342673 ↗
32. Southwell R. P. · J. Vac. Sci. Technol. A · 1995 · 13 · 22110.1116/1.579402 ↗
33. Southwell R. P. · J. Electrochem. Soc. · 1997 · 144 · 212210.1149/1.1837751 ↗
34. Wang M. H. · J. Appl. Phys. · 1992 · 71 · 591810.1063/1.350441 ↗
35. Fowler R. H. · Proc. R. Soc. London, Ser. A · 1928 · 119 · 17310.1098/rspa.1928.0091 ↗