Corrosion Resistance of Thiol- and Alkene-Passivated Germanium Nanowires
Source abstract
Abstract
The corrosion resistance of organic monolayer-coated germanium (Ge) nanowires was tested by exposure to various harsh chemical treatments, including boiling water, concentrated sulfuric acid, and hydrogen peroxide. The Ge nanowires were grown by the supercritical fluid−liquid−solid (SFLS) process with in situ thermal hydrogermylation or thiolation, with alkyl monolayer coatings of varying chain length, from 6 to 18 C atoms. All of these nanowires exhibited almost-imperceptible surface oxidation in air or water, and degraded only when exposed to the harshest oxidative conditions. Nanowires with monolayers attached through Ge−C and Ge−S bonds exhibited similar corrosion resistance, except when exposed to peroxide, in which case the alkylated nanowires were more resistant to oxidation.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanowire Synthesis and Applications · Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemical Engineering, Texas Materials Institute, Center for Nano and Molecular Science and Technology, The University of Texas at Austin, Austin, Texas 78712
References (32)
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