journal article·2003-06-01

Novel Bimetallic Thiocarboxylate Compounds as Single-Source Precursors to Binary and Ternary Metal Sulfide Materials

Theivanayagam C. Deivaraj, Jin-Ho Park, Mohammad Afzaal, Paul O'Brien,* and, Jagadese J. Vittal

Chemistry of Materials· Volume 15· Issue 12
Publisher page

Abstract

The binuclear compounds [(Ph 3 P)CuM(SC{O}Ph) 4 ] (M = Ga ( 1 ) or In ( 2 )), [(Ph 3 P) 2 AgGa(SC{O}Ph) 4 ] ( 3 ), [(Ph 3 P) 2 AgIn(SC{O}R) 4 ] (R = Me ( 4 ) or Ph ( 5 )) have been synthesized and characterized. The solid-state structures of compounds 1 − 3 have been determined by X-ray crystallography. Thermogravimetry and pyrolysis studies revealed that these compounds decompose to give the corresponding ternary metal sulfide materials. However, using the aerosol-assisted chemical vapor deposition (AACVD) method, In 2 S 3 thin films were obtained from 2 and AgIn 5 S 8 thin films were obtained from compounds 4 and 5 .
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Research context

OpenAlex topics: Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemistry, National University of Singapore, Singapore 117543, and The Manchester Materials Science Centre and Department of Chemistry, The University of Manchester, Oxford Road, Manchester, UK M13 9PL

References (46)

Show source-provided references
1. Bochmann M. · Chem. Vap. Deposition · 1996 · 2 · 8510.1002/cvde.19960020302 ↗
2. O'Brien P. · J. Mater. Chem. · 1995 · 5 · 176110.1039/jm9950501761 ↗
3. Lazell M. · J. Chem. Soc., Dalton Trans. · 2000 · 447910.1039/b004454g ↗
4. Gleizes A. N. · Chem. Vap. Deposition · 2000 · 6 · 15510.1002/1521-3862(200008)6:4<155::AID-CVDE155>3.0.CO;2-Y ↗
5. Thiel F. A. · J. Electrochem. Soc. · 1982 · 129 · 157010.1149/1.2124210 ↗
6. Wu Y. L. · Thin Solid Films · 1989 · 168 · 11310.1016/0040-6090(89)90694-9 ↗
7. Oishi K. · J. Cryst. Growth · 1997 · 177 · 8810.1016/S0022-0248(96)00796-8 ↗
8. Abrahams S. C. · J. Chem. Phys. · 1973 · 59 · 162510.1063/1.1680242 ↗
9. Yonenga I. · J. Cryst. Growth · 1996 · 167 · 61610.1016/0022-0248(96)00269-2 ↗
10. Hirpo W. · J. Am. Chem. Soc. · 1993 · 115 · 159710.1021/ja00057a067 ↗
11. Hollingsworth J. A. · Chem. Vap. Deposition · 1999 · 5 · 10510.1002/(SICI)1521-3862(199906)5:3<105::AID-CVDE105>3.0.CO;2-G ↗
12. Nomura R. · J. Mater. Chem. · 1992 · 2 · 76510.1039/jm9920200765 ↗
13. Nomura R. · Polyhedron · 1990 · 9 · 36110.1016/S0277-5387(00)80591-4 ↗
14. Banger K. K. · Thin Solid Films · 2002 · 403 · 39010.1016/S0040-6090(01)01517-6 ↗
15. Banger K. K. · Chem. Mater. · 2001 · 13 · 382710.1021/cm010507o ↗
16. Vittal J. J. · Inorg. Chem. · 1993 · 32 · 79110.1021/ic00058a007 ↗
17. Vittal J. J. · Inorg. Chem. · 1996 · 35 · 308910.1021/ic9514298 ↗
18. Vittal J. J. · Inorg. Chem. · 1998 · 37 · 166110.1021/ic971195n ↗
19. Devy R. · Inorg. Chem. · 1998 · 37 · 693910.1021/ic980394j ↗
20. Sampanthar J. T. · J. Chem. Soc., Dalton Trans. · 1999 · 441910.1039/a906494j ↗
21. Sampanthar J. T. · J. Chem. Soc., Dalton Trans. · 1999 · 315310.1039/a904718b ↗
22. Deivaraj T. C. · J. Inorg. Chem. · 2000 · 39 · 102810.1021/ic9907314 ↗
23. Deivaraj T. C. · J. Inorg. Chem. · 2000 · 39 · 307110.1021/ic0000810 ↗
24. Deivaraj T. C. · J. Chem. Soc., Dalton Trans. · 2001 · 32210.1039/b007867k ↗
25. Deivaraj T. C. · J. Chem. Soc., Dalton Trans. · 2001 · 32910.1039/b007122f ↗
26. Deivaraj T. C. · J. Inorg. Chem. · 2002 · 41 · 375510.1021/ic025533i ↗
27. Lin M. · J. Chem. Commun. · 2002 · 140010.1039/b203156f ↗
28. Deivaraj T. C. · J. Chem. Commun. · 2001 · 230410.1039/b106923c ↗
29. Kubas G. · J. Inorg. Synth. · 1970 · 19 · 93
30. SMART & SAINT Software Reference Manuals, Version 4.0; Siemens Energy & Automation, Inc. Analytical Instrumentation: Madison, WI, 1996.
31. Sheldrick G. M. · 2000
32. SHELXTL Reference Manual, Version 5.1; Bruker Analytical X-ray Systems, Inc. Madison, WI, 1997.
33. Allen F. H. · J. Chem. Inf. Comput. Sci. · 1991 · 31 · 18710.1021/ci00002a004 ↗
34. Suh S. · J. Am. Chem. Soc. · 2000 · 122 · 939610.1021/ja000845a ↗
35. Bondi A. · J. Phys. Chem. · 1964 · 68 · 44110.1021/j100785a001 ↗
36. Shang G. · Chem. Commun. · 1996 · 173310.1039/cc9960001733 ↗
37. Shang G. · Chem. Vap. Deposition · 1996 · 2 · 24210.1002/cvde.19960020606 ↗
38. Nyman M. D. · Chem. Vap. Deposition · 1996 · 2 · 17110.1002/cvde.19960020503 ↗
39. Nyman M. D. · Chem. Mater. · 1998 · 10 · 91410.1021/cm9706816 ↗
40. Nyman M. D. · Inorg. Chem. · 1997 · 36 · 221810.1021/ic960784a ↗
41. Nomura R. · Thin Solid Films · 1992 · 209 · 14510.1016/0040-6090(92)90664-W ↗
42. Muetterties E. L. · J. Am. Chem. Soc. · 1972 · 94 · 638610.1021/ja00773a022 ↗
43. Barron P. F. · J. Chem. Soc., Dalton Trans. · 1986 · 196510.1039/DT9860001965 ↗
44. Nakajima H. · Inorg. Nucl. Chem. · 1975 · 37 · 246310.1016/0022-1902(75)80871-2 ↗
45. Black J. R. · J. Chem. Soc., Dalton Trans. · 1993 · 312910.1039/dt9930003129 ↗
46. Bonnington L. S. · Inorg. Chim. Acta · 1999 · 290 · 21310.1016/S0020-1693(99)00151-6 ↗