Highly Oriented V2O5 Nanocrystalline Thin Films by Plasma-Enhanced Chemical Vapor Deposition
Source abstract
Abstract
Plasma-enhanced chemical vapor deposition of vanadium pentoxide thin films from a vanadyl(IV) β-diketonate compound has been performed in a low-pressure reactor under different operating conditions. The effect of various parameters, such as the flow rates of the carrier and reactive gas and the substrate temperatures, on films composition, microstructure, and morphology was investigated in detail. Controlled variations of the synthesis conditions allowed a fine modulation of the sample properties, as shown by XRD and AFM analyses. In particular, at 200 °C and moderate oxygen flow, nanophasic V 2 O 5 with a strong (001) preferential orientation could be easily obtained. The composition and purity of the films are studied by XPS and SIMS analyses, with special regard to film−substrate interdiffusion phenomena. Optical properties of the films are also investigated.
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Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials · Catalysis and Oxidation Reactions · Catalytic Processes in Materials Science
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Centro di Studio sulla Stabilità e Reattività dei Composti di Coordinazione del CNR and Dipartimento di Chimica Inorganica, Metallorganica ed Analitica, Università di Padova, via Marzolo, 1-35131 Padova, Italy, or via Loredan, 4-35131 Padova, Italy; INFM and Dipartimento di Fisica, Università di Padova, via Marzolo, 8-35131 Padova, Italy; DTG, Università di Padova, Viale X Giugno, 22 36100 Vicenza, Italy
References (39)
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