Low Temperature Thermal Atomic Layer Deposition of Cobalt Metal Films

ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTLow Temperature Thermal Atomic Layer Deposition of Cobalt Metal FilmsJoseph P. Klesko, Marissa M. Kerrigan, and Charles H. Winter*View Author Information Department of Chemistry, Wayne State University, Detroit, Michigan 48202, United States*C. H. Winter. E-mail: [email protected]Cite this: Chem. Mater. 2016, 28, 3, 700–703Publication Date (Web):January 21, 2016Publication History Received8 September 2015Revised8 January 2016Published online22 January 2016Published inissue 9 February 2016https://pubs.acs.org/doi/10.1021/acs.chemmater.5b03504https://doi.org/10.1021/acs.chemmater.5b03504rapid-communicationACS PublicationsCopyright © 2016 American Chemical SocietyRequest reuse permissionsArticle Views4690Altmetric-Citations59LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-AlertscloseSupporting Info (1)»Supporting Information Supporting Information SUBJECTS:Atomic layer deposition,Cobalt,Crystallization,Deposition,Metals Get e-Alerts