Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films
Source abstract
Abstract
Robust and scalable thin-film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for the zeolitic imidazolate framework-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Metal-Organic Frameworks: Synthesis and Applications · ZnO doping and properties · Corrosion Behavior and Inhibition
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Research Group of Electrochemical and Surface Engineering, Department of Materials and Chemistry, Vrije Universiteit Brussel, Pleinlaan 2, Brussels 1050, Belgium
imec, Kapeldreef 75, Leuven 3001, Belgium
Instituto de Ciencia Molecular, Universitat de València, Catedrático José Beltrán 2, Paterna 46980, Spain
Funding
Herculesstichting · Ministerio de Econom?a y Competitividad · Fonds Wetenschappelijk Onderzoek · Ministerio de Educaci?n, Cultura y Deporte · H2020 European Research Council
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