A New Photoresist Based on Calix[4]resorcinarene Dendrimer

A new dendrimer ( 1 ), which contains phenol groups in the exterior for solubilization in aqueous alkaline solution and calix[4]resorcinarene in the interior to increase the molecular weight and number of the phenol group even in the lower generation, was designed as new negative-working, alkaline-developable photoresist material. A negative-working photoresist based on 1, 2,6-bis(hydroxymethyl)phenol as cross-linker, and diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate as a photoacid generator has been developed. This resist gave a clear negative pattern through postbaking at 110 °C after exposure to UV light, followed by developing with a 0.3% aqueous tetramethylammonium hydroxide solution at room temperature.