Atomic Layer Deposition of Titanium Oxide on Self-Assembled-Monolayer-Coated Gold

We demonstrate an atomic layer deposition of TiO 2 thin films on self-assembled monolayers of ω-functionalized alkanethiolates. The TiO 2 thin films were grown on OH-terminated alkanethiolate monolayer-coated gold by atomic layer deposition at 100 °C. The atomic layer deposition of the TiO 2 thin films is self-controlled and extremely linear relative to the number of cycles. Selective deposition of the TiO 2 thin film using atomic layer deposition was accomplished with patterned self-assembled monolayers as templates. Microcontact printing was done to prepare the patterned monolayers of the alkanethiolates on gold substrates. The selective atomic layer deposition is based on the fact that the TiO 2 thin film is selectively deposited only on the regions exposing OH-terminated alkanethiolate monolayers of the gold substrates, because the regions covered with CH 3 -terminated monolayers do not have any functional group to react with precursors.