Structural, magnetic and electrical properties of nickelthin films deposited on Si (100) substrates by pulsed laser deposition

Department of Physics, University of Sargodha, Sargodha 40100, Pakistan; M. N. Rizwan; C. Bell; School of Physics, University of Bristol, Tyndall Avenue, BS8 1TL, UK; M. A. Kalyar; Department of Physics, University of Sargodha, Sargodha 40100, Pakistan; A. R. Makhdoom; Department of Natural Sciences and Humanities, Rachna College of Engineering and Technology, UET, Lahore; M. Anwar-ul-Haq; Department of Physics, University of Sargodha, Sargodha 40100, Pakistan; E. Gilory; School of Physics, University of Bristol, Tyndall Avenue, BS8 1TL, UK

doi:10.15251/jor.2021.173.225

journal article·2021-05Open access

Structural, magnetic and electrical properties of nickelthin films deposited on Si (100) substrates by pulsed laser deposition

Department of Physics, University of Sargodha, Sargodha 40100, Pakistan, M. N. Rizwan, C. Bell, School of Physics, University of Bristol, Tyndall Avenue, BS8 1TL, UK, M. A. Kalyar, Department of Physics, University of Sargodha, Sargodha 40100, Pakistan, A. R. Makhdoom, Department of Natural Sciences and Humanities, Rachna College of Engineering and Technology, UET, Lahore, M. Anwar-ul-Haq, Department of Physics, University of Sargodha, Sargodha 40100, Pakistan, E. Gilory, School of Physics, University of Bristol, Tyndall Avenue, BS8 1TL, UK

Journal of Ovonic Research· Volume 17· Issue 3

Publisher page Open full text

Source abstract

Abstract

Nickel thin films have been deposited on silicon (100) substrates by pulsed laser deposition at various substrate temperatures, Ts , in the range 100 - 700 ºC. X-ray diffraction analysis confirms nickel phases are present for Ts in the range 100 - 300 ºC, while above 500 ºC Ni-Si phases were observed. The grain size and roughness of thin films were in the range 30 nm - 590 nm and 4.3 - 15.7 nm respectively for thickness of the films is in the range 45 nm - 100 nm. Systematic variation with Ts was found for these morphological parameters, as well as the ratio of the remnant to saturation magnetic moment, magnetic coercivity and magnetoresistance.

Source: crossref · Quality: baseline

Research context

Materials processing

OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and interfaces · Metallurgical and Alloy Processes

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References

Reference metadata was not supplied for this record.