journal article·2023-04Open access

Influence of bath temperature and deposition time on hardness and magnetisation of electrodeposited Nickel Manganese Tungsten thin films

Department of Physics, Velalar College of Engineering and Technology, Erode12, Tamilnadu, India, P. Kirthika, N. Thangaraj, Department of Physics, Velalar College of Engineering and Technology, Erode12, Tamilnadu, India, P. Anitha, Department of Physics, Vellalar College for Women, Erode-12, Tamilnadu, India

Journal of Ovonic Research· Volume 19· Issue 2

Abstract

The Nickel Manganese Tungsten (Ni-Mn-W) thin films were prepared at different temperature and time of deposition on copper substrate. The crystal structure and morphology of deposits were analysed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The XRD revealed that the structure of Ni-Mn-W thin films with have an average grain size of about 28 nm for 45o C. The elemental analysis of Ni-Mn-W thin films were obtained by energy dispersive X-ray spectroscopy (EDAX). The magnetic properties of electrodeposited Ni-Mn-W thin films were obtained by vibrating sample magnetometer (VSM). The magnetic parameters of Ni-Mn-W films such as coercivity and saturation magnetization were decreased with increasing of grain size. The hardness of the films was studies by Vicker Hardness tester through diamond intender method.
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Research context

OpenAlex topics: Electrodeposition and Electroless Coatings · Advanced materials and composites · High Entropy Alloys Studies

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